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Positive Interaction between Charge Trapping and Polarization Switching in Metal-Interlayer-Ferroelectric-Interlayer-Silicon (MIFIS) Ferroelectric Field-Effect Transistor
  • Choi, Hyojun;
  • Kim, Giuk;
  • Lee, Sangho;
  • Shin, Hunbeom;
  • Lim, Youngjin;
  • Kim, Kang;
  • Kim, Do Hyung;
  • Oh, Il Kwon;
  • Park, Sang Hee Ko;
  • Ahn, Jinho;
et al
  • 2024-01-01
  • IEEE Electron Device Letters, Vol.45, pp.2351-2354
  • Institute of Electrical and Electronics Engineers Inc.
Impact of Work-Function Variation in Ferroelectric Field-Effect Transistoroa mark
  • 2024-01-01
  • IEEE Journal of the Electron Devices Society, Vol.12, pp.779-784
  • Institute of Electrical and Electronics Engineers Inc.
An Area-Efficient Systolic Array Redundancy Architecture for Reliable AI Accelerator
  • 2024-01-01
  • IEEE Transactions on Very Large Scale Integration (VLSI) Systems, Vol.32, pp.1950-1954
  • Institute of Electrical and Electronics Engineers Inc.
Kinetically Stabilized Hafnia Ferroelectric of Al-Doped HfO2 Film by Fast Ramping and Fast Cooling Process
  • Zhang, Lingwei;
  • Kim, Giuk;
  • Lee, Sangho;
  • Shin, Hunbeom;
  • Lim, Youngjin;
  • Kim, Kang;
  • Oh, Il Kwon;
  • Ko Park, Sang Hee;
  • Ahn, Jinho;
  • Jeon, Sanghun
  • 2024-01-01
  • IEEE Transactions on Electron Devices, Vol.71, pp.7398-7404
  • Institute of Electrical and Electronics Engineers Inc.
An Efficient Test Architecture Using Hybrid Built-In Self-Test for Processing-in-Memory
  • 2024-01-01
  • IEEE Transactions on Very Large Scale Integration (VLSI) Systems
  • Institute of Electrical and Electronics Engineers Inc.
A Cost-Effective Per-Pin ALPG for High-Speed Memory Testing
  • 2024-01-01
  • IEEE Transactions on Very Large Scale Integration (VLSI) Systems
  • Institute of Electrical and Electronics Engineers Inc.
Optimizing De-Trap Pulses in Gate-Injection Type Ferroelectric NAND Cells to Minimize Read after Write Delay Issue
  • Kim, Giuk;
  • Choi, Hyojun;
  • Cho, Hongrae;
  • Lee, Sangho;
  • Shin, Hunbeom;
  • Kang, Hyunjun;
  • Kim, Hoon;
  • Shin, Seokjoong;
  • Park, Seonjae;
  • Kwon, Sunseong;
et al
  • 2024-01-01
  • IEEE Electron Device Letters, Vol.45, pp.2359-2362
  • Institute of Electrical and Electronics Engineers Inc.
A Built-In Self-Repair With Maximum Fault Collection and Fast Analysis Method for HBM
  • Yoon, Joonsik;
  • Lee, Hayoung;
  • Moon, Youngki;
  • Shin, Seung Ho;
  • Kang, Sungho
  • 2024-01-01
  • IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
  • Institute of Electrical and Electronics Engineers Inc.
Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides
  • Lee, Sanghun;
  • Seo, Seunggi;
  • Lee, Woo Jae;
  • Noh, Wontae;
  • Kwon, Se Hun;
  • Oh, Il Kwon;
  • Kim, Hyungjun
  • 2023-12-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.41
  • AVS Science and Technology Society
Perfect Absorption and Reflection Modulation Based on Asymmetric Slot-Assisted Gratings without Mirrorsoa mark
  • 2023-11-01
  • Nanomaterials, Vol.13
  • Multidisciplinary Digital Publishing Institute (MDPI)
High Detectivity Near Infrared Organic Photodetectors Using an Asymmetric Non-Fullerene Acceptor for Optimal Nanomorphology and Suppressed Dark Current
et al
  • 2023-10-10
  • ACS Nano, Vol.17, pp.18792-18804
  • American Chemical Society
Area-Selective Atomic Layer Deposition for Resistive Random-Access Memory Devices
  • Oh, Il Kwon;
  • Khan, Asir Intisar;
  • Qin, Shengjun;
  • Lee, Yujin;
  • Wong, H. S.Philip;
  • Pop, Eric;
  • Bent, Stacey F.
  • 2023-09-13
  • ACS Applied Materials and Interfaces, Vol.15, pp.43087-43093
  • American Chemical Society
Achieving Highly Sensitive Near-Infrared Organic Photodetectors using Asymmetric Non-Fullerene Acceptoroa mark
  • Lee, Un Hak;
  • Park, Byoungwook;
  • Rhee, Seunghyun;
  • Ha, Jong Woon;
  • Whang, Dong Ryeol;
  • Eun, Hyeong Ju;
  • Kim, Jong H.;
  • Shim, Yeongseok;
  • Heo, Junseok;
  • Lee, Changjin;
et al
  • 2023-09-04
  • Advanced Optical Materials, Vol.11
  • John Wiley and Sons Inc
Novel SHAL base derived cobalt containing organic semiconducting metallogel thin film for self-powered high-performance photodetector applicationoa mark
  • Pandey, Vinay Kumar;
  • Kim, Young Hoon;
  • Choi, Hwayong;
  • Dubey, Mrigendra;
  • Hasan, Sayad Hadi;
  • Heo, Junseok;
  • Pandey, Rajiv Kumar
  • 2023-09-01
  • Optical Materials, Vol.143
  • Elsevier B.V.
Towards Mirror-Less Graphene-Based Perfect Absorbersoa mark
  • 2023-09-01
  • Applied Sciences (Switzerland), Vol.13
  • Multidisciplinary Digital Publishing Institute (MDPI)
Non-Line-of-Sight Detection Based on Neuromorphic Time-of-Flight Sensing
  • Park, Minseong;
  • Yuan, Yuan;
  • Baek, Yongmin;
  • Bae, Byungjoon;
  • Park, Bo In;
  • Kim, Young Hoon;
  • Lin, Nicholas;
  • Heo, Junseok;
  • Lee, Kyusang
  • 2023-08-16
  • ACS Photonics, Vol.10, pp.2739-2745
  • American Chemical Society
Facile controlled synthesis of bifunctional ZnO nanoparticles for application as a high-performance self-powered UV photosensor and highly selective vapor sensor
  • Kumar Pandey, Rajiv;
  • Choi, Hwayong;
  • Yi, Junsin;
  • Heo, Junseok;
  • Kumar Sahu, Praveen
  • 2023-07-01
  • Materials Science and Engineering: B, Vol.293
  • Elsevier Ltd
Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor
  • Choi, Ae Rim;
  • Seo, Seunggi;
  • Kim, Seiyon;
  • Kim, Dohee;
  • Ryu, Seung Wook;
  • Lee, Woo Jae;
  • Oh, Il Kwon
  • 2023-07-01
  • Applied Surface Science, Vol.624
  • Elsevier B.V.
High-Performance Thin-Film VCSELs Integrated with a Copper-Plated Heatsinkoa mark
  • 2023-06-27
  • Advanced Materials Interfaces, Vol.10
  • John Wiley and Sons Inc
Molecular Layer Deposition of Organic-Inorganic Hafnium Oxynitride Hybrid Films for Electrochemical Applications
  • Ablat, Hayrensa;
  • Oh, Il Kwon;
  • Richey, Nathaniel E.;
  • Oyakhire, Solomon T.;
  • Yang, Yufei;
  • Zhang, Wenbo;
  • Huang, William;
  • Cui, Yi;
  • Bent, Stacey F.
  • 2023-06-12
  • ACS Applied Energy Materials, Vol.6, pp.5806-5816
  • American Chemical Society
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