Ajou University repository

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Showing results 1 to 10 of 4241 (Search time: 0.0 seconds).

Room temperature deposited highly conductive HfNx films for high-performance HfN/Si junction diodes
  • 2024-10-01
  • Surfaces and Interfaces, Vol.53
  • Elsevier B.V.
Proper flying capacitor selection for performance enhancement of five-level hybrid active neutral-point-clamped inverters
  • 2022-10-01
  • Journal of Power Electronics, Vol.22, pp.1687-1698
  • Springer
Development of high frequency pMUT based on sputtered PZT
  • 2018-11-01
  • Journal of Electrical Engineering and Technology, Vol.13, pp.2434-2440
  • Korean Institute of Electrical Engineers
Review of Methods for Reducing Circulating Currents in Parallel Connected Modular Inverters
  • 2023-03-01
  • Journal of Electrical Engineering and Technology, Vol.18, pp.1227-1242
  • Korean Institute of Electrical Engineers
Frequency doubler utilizing hetero gate dielectric tunnel field-effect transistor
  • 2024-04-01
  • Physica Scripta, Vol.99
  • Institute of Physics
Reduction Method of Circulating Current in Parallel Three-Level Inverters Using Modified Discontinuous Pulse-Width Modulation Based on Interleaving Scheme
  • 2024-02-01
  • IEEE Transactions on Power Electronics, Vol.39, pp.2322-2333
  • Institute of Electrical and Electronics Engineers Inc.
Enhanced ultra high frequency EMI shielding with controlled ITO nano-branch width via different tin material types
  • Kim, Youngho;
  • Kim, Noeul;
  • Lee, Sang Hoon;
  • Hyeong, Seok Ki;
  • Lee, Jae Hyun;
  • Lee, Jaeyeong;
  • Bae, Jong Seong;
  • Cho, In Sun;
  • Choi, Jae Young;
  • Kim, Soo Young;
  • Yu, Hak Ki
  • 2023-07-21
  • Nanoscale, Vol.15, pp.13635-13644
  • Royal Society of Chemistry
과민성방광 여성 환자에서 심박동수변이의 분석
  • 김영부
  • 2006-02
  • The Graduate School, Ajou University
Ultrafast hot-electron injection at HfN-metal oxide heterojunctions: Role of barrier height
  • Singh, Ranveer;
  • Sial, Qadeer Akbar;
  • Kim, Unjeong;
  • Nah, Sanghee;
  • Seo, Hyungtak
  • 2022-12-01
  • Materials Science in Semiconductor Processing, Vol.152
  • Elsevier Ltd
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