Ajou University repository

  • Results/Page
  • Sort by
  • In order
  • Authors/record

Showing results 1 to 10 of 844 (Search time: 0.0 seconds).

Low-Temperature Direct Growth of Amorphous Boron Nitride Films for High-Performance Nanoelectronic Device Applicationsoa mark
  • Sattari-Esfahlan, Seyed Mehdi;
  • Kim, Hyoung Gyun;
  • Hyun, Sang Hwa;
  • Choi, Jun Hui;
  • Hwang, Hyun Sik;
  • Kim, Eui Tae;
  • Park, Hyeong Gi;
  • Lee, Jae Hyun
  • 2023-02-08
  • ACS Applied Materials and Interfaces, Vol.15, pp.7274-7281
  • American Chemical Society
Multilevel Nonvolatile Memory by CMOS-Compatible and Transfer-free Amorphous Boron Nitride Filmoa mark
  • Sattari-Esfahlan, Seyed Mehdi;
  • Hyun, Sang Hwa;
  • Moon, Ji Yun;
  • Heo, Keun;
  • Lee, Jae Hyun
  • 2024-11-26
  • ACS Applied Electronic Materials, Vol.6, pp.7781-7790
  • American Chemical Society
Thru-Hole Epitaxy: A Highway for Controllable and Transferable Epitaxial Growthoa mark
  • Jang, Dongsoo;
  • Ahn, Chulwoo;
  • Lee, Youngjun;
  • Lee, Seungjun;
  • Lee, Hyunkyu;
  • Kim, Donghoi;
  • Kim, Yongsun;
  • Park, Ji Yong;
  • Kwon, Young Kyun;
  • Choi, Jaewu;
  • Kim, Chinkyo
  • 2023-02-03
  • Advanced Materials Interfaces, Vol.10
  • John Wiley and Sons Inc
Controlled growth of highly stable and conducting Ge core/ BCN shell nanowire
  • Choi, Jun Hui;
  • Moon, Ji Yun;
  • Lee, Jae Hyun
  • 2024-05-01
  • Ceramics International, Vol.50, pp.15994-15999
  • Elsevier Ltd
The role of hydrogen in the nitriding of anatase TiO 2 films in the N 2 -H 2 microwave afterglows
  • Ryu, Seol;
  • Wang, Yunfei;
  • Ricard, Andre;
  • Sarrette, Jean Philippe;
  • Kim, Ansoon;
  • Kim, Yu Kwon
  • 2019-04-25
  • Surface and Coatings Technology, Vol.364, pp.341-346
  • Elsevier B.V.
Design of softened polystyrene for crack- and contamination-free large-area graphene transfer
  • Nasir, Tuqeer;
  • Kim, Bum Jun;
  • Kim, Kwan Woo;
  • Lee, Sang Hoon;
  • Lim, Hyung Kyu;
  • Lee, Dong Kyu;
  • Jeong, Byung Joo;
  • Kim, Hak Chul;
  • Yu, Hak Ki;
  • Choi, Jae Young
  • 2018-12-14
  • Nanoscale, Vol.10, pp.21865-21870
  • Royal Society of Chemistry
Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structuresoa mark
  • Dongquoc, Viet;
  • Seo, Dong Bum;
  • Anh, Cao Viet;
  • Lee, Jae Hyun;
  • Park, Jun Hong;
  • Kim, Eui Tae
  • 2022-10-01
  • Applied Sciences (Switzerland), Vol.12
  • MDPI
Room temperature deposited highly conductive HfNx films for high-performance HfN/Si junction diodes
  • 2024-10-01
  • Surfaces and Interfaces, Vol.53
  • Elsevier B.V.
RF Sputtering으로 성장한 Zinc Nitride(ZnN) 특성 연구
  • 최재원 저
  • 2018-08
  • The Graduate School, Ajou University
1 2 3 4 85