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to 10 of 1228 (Search time: 0.0 seconds).
Large-Scale Analysis of Defects in Atomically Thin Semiconductors using Hyperspectral Line Imaging
oa mark
Lim, Seungjae;
Kim, Tae Wan;
Park, Taejoon;
Heo, Yoon Seong;
Yang, Seonguk;
Seo, Hosung;
Suh, Joonki;
Lee, Jae Ung
2024-10-17
Small, Vol.20
John Wiley and Sons Inc
Strained BaTiO3 thin films via in-situ crystallization using atomic layer deposition on SrTiO3 substrate
Choi, Heung Yoon;
Jeon, Jae Deock;
Kim, Se Eun;
Jang, Seo Young;
Sung, Ju Young;
Lee, Sang Woon
2023-06-15
Materials Science in Semiconductor Processing, Vol.160
Elsevier Ltd
Influences of Process Temperature on a Phase of Ga2O3 Thin Films Grown by Atomic Layer Deposition on Sapphire
Lee, Seung Hyun;
Lee, Kang Min;
Lee, Sang Woon
2020-12-01
Bulletin of the Korean Chemical Society, Vol.41, pp.1190-1193
Wiley Blackwell
Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices
Choi, Ae Rim;
Lim, Dong Hyun;
Shin, So Yeon;
Kang, Hye Joo;
Kim, Dohee;
Kim, Ja Yong;
Ahn, Youngbae;
Ryu, Seung Wook;
Oh, Il Kwon
2024-03-12
Chemistry of Materials, Vol.36, pp.2194-2219
American Chemical Society
The Significance of an In Situ ALD Al2O3 Stacked Structure for p-Type SnO TFT Performance and Monolithic All-ALD-Channel CMOS Inverter Applications
oa mark
Kim, Hye Mi;
Choi, Su Hwan;
Lee, Han Uk;
Cho, Sung Beom
;
Park, Jin Seong
2023-04-01
Advanced Electronic Materials, Vol.9
John Wiley and Sons Inc
Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films
Lee, Yujin;
Kim, Kangsik;
Lee, Zonghoon;
Lee, Hong Sub;
Lee, Han Bo Ram;
Kim, Woo Hee;
Oh, Il Kwon
;
Kim, Hyungjun
2023-03-28
Chemistry of Materials, Vol.35, pp.2312-2320
American Chemical Society
Polar Perturbations in Functional Oxide Heterostructures
Oh, Yoon Seok;
Wang, Lingfei;
Lee, Hyungwoo
;
Choi, Woo Seok;
Kim, Tae Heon
2023-09-05
Advanced Functional Materials, Vol.33
John Wiley and Sons Inc
Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
Lee, Yujin;
Seo, Seunggi;
Nam, Taewook;
Lee, Hyunho;
Yoon, Hwi;
Sun, Sangkyu;
Oh, Il Kwon
;
Lee, Sanghun;
Shong, Bonggeun;
Seo, Jin Hyung;
Seok, Jang Hyeon;
Kim, Hyungjun
2021-12-01
Applied Surface Science, Vol.568
Elsevier B.V.
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nonlinear optics
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organic crystals
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Atomic layer deposition
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graphene
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terahertz waves
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atomic layer deposition
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MoS2
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