Ajou University repository

IEEE Journal of the Electron Devices Society
ISSN
  • P2168-6734
Publisher

Institute of Electrical and Electronics Engineers Inc.

Listed on
(Coverage)

JCR2015-2023

SJR2014-2020;2022-2023

CiteScore2013-2023

SCIE2015-2024

CC2016-2024

SCOPUS2017-2024

DOAJ2017-2024

OA Info.
OA oa mark

based on the information

  • 2017;2018;2019;2020;2021;2022;2023;2024;2025;
Keywords field effect transistors, logic gates, integrated circuit devices, display technologies, wearable devices
Review Process Anonymous peer review
Journal info.
pages
Licences CC BY, CC BY-NC-ND
Copyrights Yes
DOAJ Coverage Added on Date : 2014-10-23T13:53:10Z
Subject(s) Technology: Electrical engineering. Electronics. Nuclear engineering
Active
Active

based on the information

  • SCOPUS:2024-10
Country
USA
Aime & Scopes
The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC's, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original. All research papers benefit from rapid peer review and publication, and are deposited in IEEE Xplore.
Article List

Showing results 1 to 3 of 3

Impact of Self-Heating Effect on DC and AC Performance of FD-SOI CMOS Inverteroa mark
  • 2025-01-01
  • IEEE Journal of the Electron Devices Society, Vol.13, pp.41-48
  • Institute of Electrical and Electronics Engineers Inc.
Impact of Work-Function Variation in Ferroelectric Field-Effect Transistoroa mark
  • 2024-01-01
  • IEEE Journal of the Electron Devices Society, Vol.12, pp.779-784
  • Institute of Electrical and Electronics Engineers Inc.
Graded crystalline HfO gate dielectric layer for high-k/Ge MOS gate stackoa mark
  • 2021-01-01
  • IEEE Journal of the Electron Devices Society, Vol.9, pp.295-299
  • Institute of Electrical and Electronics Engineers Inc.
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