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Ferroelectric α-In2Se3 Wrapped-Gate β-Ga2O3 Field-Effect Transistors for Dynamic Threshold Voltage Control
  • Yang, Jeong Yong ;
  • Yeom, Min Jae ;
  • Park, Youngseo ;
  • Heo, Junseok ;
  • Yoo, Geonwook
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Publication Year
2021-08-01
Publisher
John Wiley and Sons Inc
Citation
Advanced Electronic Materials, Vol.7
Keyword
beta-gallium oxideferroelectricindium selenidethreshold voltage controlwrapped-gate structure
Mesh Keyword
Dynamic thresholdElectrical performanceElectrostatic gatesFerroelectric semiconductorsField effect transistor (FETs)Positive voltageSubthreshold slopeSwitching devices
All Science Classification Codes (ASJC)
Electronic, Optical and Magnetic Materials
Abstract
Indium selenide (α-In2Se3), which is a recently emerging ferroelectric semiconductor, can solve a major hindrance to applications of an ultra-wide bandgap beta-gallium oxide (β-Ga2O3) semiconductor. Here, ferroelectric α-In2Se3 wrapped-gate β-Ga2O3 field-effect transistors (FETs) for dynamic threshold voltage (VTH) control is demonstrated. The dry-transferred α-In2Se3 layer is wrapped around β-Ga2O3 channel, which allows efficient electrostatic gate modulation. Thus, the ferroelectricity of α-In2Se3 and a thin native oxide interlayer formed at the interface between β-Ga2O3 and α-In2Se3 can provide effective VTH control. Applying a positive voltage pulse to the gate electrode induces positive VTH shift; hence, the device can be even changed from depletion to enhancement (E-) mode. The E-mode β-Ga2O3 FET exhibits steep-subthreshold slope with a negligible hysteresis. The VTH of E-mode can be further modulated by applying back-gate bias, and electrical performance can be enhanced via dual-gate operation. The approach demonstrates an energy efficient β-Ga2O3-based switching device architecture integrated with ferroelectric van der Waals 2D materials.
ISSN
2199-160X
Language
eng
URI
https://dspace.ajou.ac.kr/dev/handle/2018.oak/32036
DOI
https://doi.org/10.1002/aelm.202100306
Type
Article
Funding
This work was supported by National R&D Program through the National Research Foundation of Korea (NRF) funded by Ministry of Science and ICT (2020M3F3A2A01082593), and by the Industrial Strategic Technology Development Program (20000300) funded by the Ministry of Trade, Industry and Energy (MOTIE, Korea). The EDA tool was supported by the IC Design Education Center, Korea.
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