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Tailoring of two-dimensional electron gas density in thin film oxide heterostructure via atomic layer depositionoa mark
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Publication Year
2019-01-01
Journal
Proceedings of the World Congress on New Technologies
Publisher
Avestia Publishing
Citation
Proceedings of the World Congress on New Technologies
All Science Classification Codes (ASJC)
BiotechnologyEnergy Engineering and Power TechnologyBiomedical EngineeringElectrical and Electronic EngineeringMechanical EngineeringManagement, Monitoring, Policy and LawPollutionElectronic, Optical and Magnetic Materials
Abstract
Recently, oxide heterostructure-based two-dimensional electron gas (2DEG) has received intensive attentions owing to their interesting properties. The model system is epitaxial LaAlO3 (LAO) grown on single crystalline SrTiO3 (STO) substrate.[1] Electrons with a density of 1013~1014/cm2 were observed which moves freely along in-plane direction while they are confined within ~2 nm (out-of-plane direction). Unfortunately, the adjustment of electron density was not available for the epitaxial LAO/STO heterostructure. In addition, the growth of epitaxial LAO film requires a high-temperature process (700 ~ 800°C) using pulsed laser deposition technique. Here, we demonstrated a creation and control of 2DEG at the interface of non-epitaxial Al2O3/TiO2 thin film heterostructure using atomic layer deposition (ALD). The electron density can be tailored from ~ 1011/cm2 to ~ 1014/cm2 by the control of ALD process temperature because the electrons are coming from oxygen vacancies at the interface of Al2O3/TiO2 heterostructure of which oxygen vacancy density is governed by kinetics during the ALD process. Electron density up to ~1014/cm2 was achieved at the interface of the Al2O3/TiO2 heterostructure which is 100 times higher than that of the conventional semiconductor heterojunction such as AlGaAs/GaAs. The 2DEG at Al2O3/TiO2 heterostructure can be applied for the development hydrogen (H2) gas sensor. A highperformance, transparent, and extremely thin (<15 nm) hydrogen gas sensor was fabricated using 2DEG at the interface of Al2O3/TiO2 heterostructure grown by ALD. [2] Palladium nanoparticles (≈2 nm in thickness) are used on the surface of the Al2O3/TiO2 thin film heterostructure to detect H2. Both oxides with a wide bandgap (>3.2 eV) have transmittance of 83% in the visible spectrum, which allows for a transparent sensor. The Pd/Al2O3/TiO2 gas senor detects H2 gas quickly with a short response time of <30 s even at room temperature which outperforms conventional H2 gas sensors. This sensor responds to a wide range of H2 concentration, especially from ~5 ppm to 1%, implying a promising candidate for a general H2 sensor. Interestingly, the Pd/Al2O3/TiO2 gas senor showed an optimal electron density for H2 detection owing to the tailoring ability of 2DEG at the Al2O3/TiO2 heterostructure. Particularly, a sensitivity was as low as 3% for a 2DEG density of 5.6 × 1013 cm-2 while the sensitivity was improved from 6% to 43% as the electron density decreased from 5.6 × 1013 cm-2 to 4.1 × 1011 cm-2. Besides the sensor application, other application of 2DEG will be introduced in the presentation.
ISSN
2369-8128
Language
eng
URI
https://aurora.ajou.ac.kr/handle/2018.oak/36483
https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85075120606&origin=inward
DOI
https://doi.org/10.11159/icnfa19.135
Journal URL
avestia.com/NewTech2017_Proceedings/index.html
Type
Conference
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Department of Physics
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