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Showing results 1 to 10 of 26 (Search time: 0.0 seconds).

Effect of the Plasma Gas Type on the Surface Characteristics of 3Y‐TZP Ceramicoa mark
  • 2022-03-01
  • International Journal of Molecular Sciences, Vol.23
  • MDPI
Plasma Surface Modification of 3Y-TZP at Low and Atmospheric Pressures with Different Treatment Timesoa mark
  • 2023-04-01
  • International Journal of Molecular Sciences, Vol.24
  • Multidisciplinary Digital Publishing Institute (MDPI)
Adsorptive removal of nerve-agent simulant with zirconium-based metal-organic frameworks modified by hydrophobic monocarboxylic acids
  • Cho, Kyung Ho;
  • Chitale, Sachin K.;
  • Kim, Seung Joo;
  • Cha, Ga Young;
  • Hong, Do Young;
  • Ryu, Sam Gon;
  • Chang, Jong San;
  • Hwang, Young Kyu
  • 2019-09-01
  • Microporous and Mesoporous Materials, Vol.285, pp.61-69
  • Elsevier B.V.
Interfacial engineering of ZrO2 metal-insulator-metal capacitor using Al2O3/TiO2 buffer layer for improved leakage propertiesoa mark
  • 2022-01-01
  • Journal of Asian Ceramic Societies, Vol.10, pp.649-659
  • Taylor and Francis Ltd.
Effect of Al2O3 sandblasting particle size on the surface topography and residual compressive stresses of three different dental zirconia gradesoa mark
  • 2021-02-01
  • Materials, Vol.14, pp.1-19
  • MDPI AG
Phase transformations and subsurface changes in three dental zirconia grades after sandblasting with various al2 o3 particle sizesoa mark
  • 2021-09-01
  • Materials, Vol.14
  • MDPI
Effects of plasma power on ferroelectric properties of HfO2-ZrO2 nanolaminates produced by plasma enhanced atomic layer deposition
  • 2023-04-01
  • Surfaces and Interfaces, Vol.37
  • Elsevier B.V.
Exploring Zr Influence on Microstructure and Mechanical Property in FeCoNiCrCuZr Eutectic High-Entropy Alloys
  • Dewangan, Sheetal Kumar;
  • Jain, Reliance;
  • Paswan, Manikant;
  • Patel, Arvind;
  • Samal, Sumanta;
  • Kumar, Vinod;
  • Ahn, Byungmin
  • 2024-12-01
  • Metals and Materials International, Vol.30, pp.3339-3348
  • Korean Institute of Metals and Materials
Leakage current suppression in spatially controlled Si-doped ZrO2 for capacitors using atomic layer deposition
  • Lee, Kunyoung;
  • Jang, Woochool;
  • Kim, Hyunjung;
  • Lim, Heewoo;
  • Kim, Bumsik;
  • Seo, Hyungtak;
  • Jeon, Hyeongtag
  • 2018-07-01
  • Thin Solid Films, Vol.657, pp.1-7
  • Elsevier B.V.
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