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Showing results 1 to 10 of 116 (Search time: 0.0 seconds).

The Significance of an In Situ ALD Al2O3 Stacked Structure for p-Type SnO TFT Performance and Monolithic All-ALD-Channel CMOS Inverter Applicationsoa mark
  • 2023-04-01
  • Advanced Electronic Materials, Vol.9
  • John Wiley and Sons Inc
Control of the electrical resistivity of Ni-Cr wires using low pressure chemical vapor deposition of tin
  • 2018-01-31
  • Applied Surface Science, Vol.429, pp.134-137
  • Elsevier B.V.
(Iminopyridine)Pd (II) complexes as versatile catalysts for copolymerization and terpolymerization of vinyl arene, ethylene, and carbon monoxide
  • 2021-09-01
  • Applied Organometallic Chemistry, Vol.35
  • John Wiley and Sons Ltd
Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications
  • 2021-02-23
  • ACS Applied Electronic Materials, Vol.3, pp.999-1005
  • American Chemical Society
Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structuresoa mark
  • Dongquoc, Viet;
  • Seo, Dong Bum;
  • Anh, Cao Viet;
  • Lee, Jae Hyun;
  • Park, Jun Hong;
  • Kim, Eui Tae
  • 2022-10-01
  • Applied Sciences (Switzerland), Vol.12
  • MDPI
급성 일산화탄소 중독에서의 에탄올의 신경 보호 효과
  • 김혁훈
  • 2018-08
  • The Graduate School, Ajou University
Ti-N 전도성 필름의 진공 열처리 실험에 의한 Surge 보호 부품 성능 향상에 관한 연구
  • 배장섭
  • 2010-02
  • The Graduate School, Ajou University
Morphology, resistivity and corrosion behavior of tin coatings plated from citric acid bath
  • 2019-10-18
  • Materials Research Express, Vol.6
  • Institute of Physics Publishing
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