Ajou University repository

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Showing results 1 to 10 of 4008 (Search time: 0.0 seconds).

Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether
  • 2022-01-01
  • Korean Journal of Chemical Engineering, Vol.39, pp.63-68
  • Springer
Effect of the Plasma Gas Type on the Surface Characteristics of 3Y‐TZP Ceramicoa mark
  • 2022-03-01
  • International Journal of Molecular Sciences, Vol.23
  • MDPI
Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasmaoa mark
  • 2024-08-01
  • Materials, Vol.17
  • Multidisciplinary Digital Publishing Institute (MDPI)
New plasma etching techniques for control over Si and SiO2 etch profiles
  • 조성운
  • 2015-08
  • The Graduate School, Ajou University
A passive mitigation strategy of impurity deposition on the first mirrors using duct with baffles: A case study at a port of KSTAR with in-situ deposition monitoring
  • Kim, Boseong;
  • Seon, Changrae;
  • Oh, Soo Ghee;
  • Kim, Yu Kwon;
  • An, Younghwa;
  • Bang, Eunnam;
  • Hong, Suk Ho;
  • Pak, Sunil;
  • Cheon, Munseong;
  • Lee, Hyun Gon
  • 2018-04-01
  • Fusion Engineering and Design, Vol.129, pp.269-276
  • Elsevier Ltd
Sequential doping strategy in rutile TiO2 nanorod for high performance photoanode
  • Lee, Sang Yeon;
  • Lee, Young Jae;
  • Yoo, Il Han;
  • Kim, Hyeon Woo;
  • Song, Hyejeong;
  • Heo, Soo Won;
  • Kalanur, Shankara S.;
  • Mohapatra, Gourab;
  • Rohma,;
  • Ko, Hyunseok;
  • Seo, Hyungtak
  • 2024-04-15
  • Applied Surface Science, Vol.652
  • Elsevier B.V.
A study on selective surface nitridation of TiO 2 nanocrystals in the afterglows of N 2 and N 2 -O 2 microwave plasmas
  • Jeon, Byungwook;
  • Kim, Ansoon;
  • Ricard, André;
  • Sarrette, Jean Philippe;
  • Yu, Xiaomei;
  • Kim, Yu Kwon
  • 2018-02-28
  • Applied Surface Science, Vol.432, pp.163-169
  • Elsevier B.V.
Microstructural evolution and compressive properties of nanocrystalline Ti–Fe alloy fabricated via cryomilling and spark plasma sintering
  • 2022-10-01
  • Journal of Materials Science, Vol.57, pp.18089-18100
  • Springer
Development of Highly Sensitive and Stable SAW-based Temperature Sensor Array and its Interface Electronics for Realtime Monitoring of Wafer Surface Temperature in Plasma Chamber
  • 2024-05-01
  • Journal of Electrical Engineering and Technology, Vol.19, pp.2491-2499
  • Korean Institute of Electrical Engineers
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