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Showing results 1 to 10 of 1008 (Search time: 0.0 seconds).

Oxygen Behavior in High Temperature Plasma and its Applications to Hydrocarbon Fuels
  • Uhm, Han S.;
  • Choi, Chang H.;
  • Kim, Dong J.;
  • Lee, Joo Y.;
  • Woo, Sang G.
  • 2019-12-01
  • Journal of the Korean Physical Society, Vol.75, pp.917-923
  • Korean Physical Society
Rational Design of Efficient Heavy-Atom-Free Boron-Dipyrromethene Nanophotosensitizers for Two-Photon Excited Photodynamic Therapy of Cancer
  • Nguyen, Van Nghia;
  • Lee, Dong Joon;
  • Zhang, Dianqi;
  • Ha, Jeongsun;
  • Swamy, Kunemadihalli Mathada Kotraiah;
  • Wang, Rui;
  • Kim, Hwan Myung;
  • Yu, Fabiao;
  • Yoon, Juyoung
  • 2024-06-11
  • Chemistry of Materials, Vol.36, pp.5534-5541
  • American Chemical Society
The Effect of Plasma and Humidity on Characteristics of Monolayer MoS2
  • PHUNG THI QUYNH
  • 2022-08
  • The Graduate School, Ajou University
Formation of oxygen vacancy at surfaces of ZnO by trimethylaluminumoa mark
  • Eom, Hyobin;
  • Bae, Woojin;
  • Sung, Ju Young;
  • Choi, Ji Hyeon;
  • Dae, Kyun Seong;
  • Jang, Jae Hyuck;
  • Park, Tae Joo;
  • Lee, Sang Woon;
  • Shong, Bonggeun
  • 2024-03-01
  • APL Materials, Vol.12
  • American Institute of Physics
Crystal-Phase- and B-Content-Dependent Electrochemical Behavior of Pd─B Nanocrystals toward Oxygen Reduction Reaction
  • Wahidah, Hafidatul;
  • Chun, Hee Joon;
  • Kim, Woo Hyeok;
  • Kim, Tae Wu;
  • Kim, Seok Ki;
  • Hong, Jong Wook
  • 2024-11-07
  • Small, Vol.20
  • John Wiley and Sons Inc
Effects of plasma power on ferroelectric properties of HfO2-ZrO2 nanolaminates produced by plasma enhanced atomic layer deposition
  • 2023-04-01
  • Surfaces and Interfaces, Vol.37
  • Elsevier B.V.
Vanadium oxide thin film deposited on Si by atomic layer deposition for non-volatile resistive switching memory devices
  • 2023-12-01
  • Applied Surface Science, Vol.639
  • Elsevier B.V.
Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
  • Lee, Yujin;
  • Seo, Seunggi;
  • Nam, Taewook;
  • Lee, Hyunho;
  • Yoon, Hwi;
  • Sun, Sangkyu;
  • Oh, Il Kwon;
  • Lee, Sanghun;
  • Shong, Bonggeun;
  • Seo, Jin Hyung;
  • Seok, Jang Hyeon;
  • Kim, Hyungjun
  • 2021-12-01
  • Applied Surface Science, Vol.568
  • Elsevier B.V.
Chemical mechanism of formation of two-dimensional electron gas at the Al2O3/TiO2 interface by atomic layer depositionoa mark
  • Park, Jeongwoo;
  • Eom, Hyobin;
  • Kim, Seong Hwan;
  • Seok, Tae Jun;
  • Park, Tae Joo;
  • Lee, Sang Woon;
  • Shong, Bonggeun
  • 2021-12-01
  • Materials Today Advances, Vol.12
  • Elsevier Ltd
The role of hydrogen in the nitriding of anatase TiO 2 films in the N 2 -H 2 microwave afterglows
  • Ryu, Seol;
  • Wang, Yunfei;
  • Ricard, Andre;
  • Sarrette, Jean Philippe;
  • Kim, Ansoon;
  • Kim, Yu Kwon
  • 2019-04-25
  • Surface and Coatings Technology, Vol.364, pp.341-346
  • Elsevier B.V.
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