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Showing results 1 to 10 of 1788 (Search time: 0.0 seconds).

Position-Selective Metal Oxide Nanostructures using Atomic Thin Carbon Layer for Hydrogen Gas Sensorsoa mark
  • 2020-11-01
  • Journal of Sensor Science and Technology, Vol.29, pp.369-373
  • Korean Sensors Society
Multifunctional Nanohybrid of Alumina and Indium Oxide Prepared Using the Atomic Layer Deposition Technique
  • Duy, Le Thai;
  • Kang, Hyunwoo;
  • Shin, Hee Cheol;
  • Han, Seunggik;
  • Singh, Ranveer;
  • Seo, Hyungtak
  • 2021-12-15
  • ACS Applied Materials and Interfaces, Vol.13, pp.59115-59125
  • American Chemical Society
Highly flexible deep-ultraviolet photodetectors using amorphous gallium oxide thin films grown by atomic layer deposition
  • 2022-12-01
  • Materials Today Communications, Vol.33
  • Elsevier Ltd
Correlation of band electronic structure with efficiency in perovskite solar cells with vanadium (Ⅳ) oxide thin film buffers
  • 2021-03-01
  • Current Applied Physics, Vol.23, pp.62-67
  • Elsevier B.V.
Enhancing the oxidation resistance of nanocrystalline high-entropy AlCuCrFeMn alloys by the addition of tungstenoa mark
  • Dewangan, Sheetal Kumar;
  • Kumar, Devesh;
  • Sharma, Ashutosh;
  • Ahn, Byungmin;
  • Kumar, Vinod
  • 2022-11-01
  • Journal of Materials Research and Technology, Vol.21, pp.4960-4968
  • Elsevier Editora Ltda
Enhanced temperature coefficient of resistance of VOX-based uncooled microbolometers manufactured by plasma enhanced atomic layer deposition
  • Kim, Unjeong;
  • Kim, Dukhwan;
  • Lim, Seokwon;
  • Jeon, Yerin;
  • Kim, Jisu;
  • Lee, Jinchan;
  • Kim, Junmo;
  • Thai Duy, Le;
  • Seo, Hyungtak
  • 2024-02-01
  • Applied Surface Science, Vol.645
  • Elsevier B.V.
Highly transparent conducting Two-Dimensional electron gas channel in ultrathin heterostructures for flexible optoelectronic device applications
  • 2022-04-01
  • Applied Surface Science, Vol.580
  • Elsevier B.V.
Surface oxidation behavior of spark plasma sintered AlCrCuFeMnWx high entropy alloys at an elevated isothermal temperature
  • 2024-02-01
  • International Journal of Refractory Metals and Hard Materials, Vol.119
  • Elsevier Ltd
Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al2O3with a Series of Alcohol Oxidants
  • Seo, Seunggi;
  • Woo, Whang Je;
  • Lee, Yujin;
  • Yoon, Hwi;
  • Kim, Miso;
  • Oh, Il Kwon;
  • Chung, Seung Min;
  • Kim, Hyungjun;
  • Shong, Bonggeun
  • 2021-08-26
  • Journal of Physical Chemistry C, Vol.125, pp.18151-18160
  • American Chemical Society
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