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Highly flexible deep-ultraviolet photodetectors using amorphous gallium oxide thin films grown by atomic layer deposition
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Publication Year
2022-12-01
Publisher
Elsevier Ltd
Citation
Materials Today Communications, Vol.33
Keyword
Amorphous gallium oxideAtomic layer depositionDeep-ultraviolet wavelengthsFlexible photodetectorsWide-bandgap materials
Mesh Keyword
Amorphous gallium oxideAtomic-layer depositionDeep ultravioletDeep-ultraviolet wavelengthFlexible photodetectorsGallium oxidesHigh flexibilityUltra-violet photodetectorsUltraviolet wavelengthWide band-gap material
All Science Classification Codes (ASJC)
Materials Science (all)Mechanics of MaterialsMaterials Chemistry
Abstract
Flexible deep ultraviolet (DUV) photodetectors have increased applicability in healthcare and electronic skin, however, sufficient flexibility of DUV photodetectors has not yet been achieved. In this study, we developed highly flexible DUV photodetectors using amorphous gallium oxide (GaOx) films grown by atomic layer deposition, which enabled a bending radius as small as 1.5 mm. The high flexibility originated from a residual compressive strain in the GaOx films and the amorphous nature of the thin GaOx films (~ 25 nm) grown on polyimide substrates. Therefore, the high flexibility of DUV photodetectors can provide a promising opportunity in healthcare systems, e-skins, and wearable applications.
ISSN
2352-4928
Language
eng
URI
https://dspace.ajou.ac.kr/dev/handle/2018.oak/32855
DOI
https://doi.org/10.1016/j.mtcomm.2022.104268
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Type
Article
Funding
This work was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF), funded by the Ministry of Science, ICT, and Future Planning (No. NRF-2022R1F1A1073990 ), and the Basic Research Laboratory Project of the Korean Government (MSIP) (No. NRF-2020R1A4A1018935 ).
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Department of Physics
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