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Showing results 1 to 10 of 222 (Search time: 0.0 seconds).

Process modeling of syngas conversion to ethanol and acetic acid via the production of dimethyl ether and its carbonylation
  • 2022-12-01
  • Korean Journal of Chemical Engineering, Vol.39, pp.3204-3213
  • Springer
Plasma etching of SiO2 using heptafluoropropyl methyl ether and perfluoropropyl vinyl ether
  • 2018-01-01
  • ECS Journal of Solid State Science and Technology, Vol.7, pp.Q218-Q221
  • Electrochemical Society Inc.
Gas-Phase Carbonylation of Dimethyl Ether on the Stable Seed-Derived Ferrierite
  • Ham, Hyungwon;
  • Jung, Hyun Seung;
  • Kim, Hyo Seok;
  • Kim, Jihyeon;
  • Cho, Sung June;
  • Lee, Won Bo;
  • Park, Myung June;
  • Bae, Jong Wook
  • 2020-05-01
  • ACS Catalysis, Vol.10, pp.5135-5146
  • American Chemical Society
Controlling Bowing and Narrowing in SiO2 Contact-Hole Etch Profiles Using Heptafluoropropyl Methyl Ether as an Etchant with Low Global Warming Potentialoa mark
  • You, Sanghyun;
  • Yang, Hyun Seok;
  • Jeon, Dongjun;
  • Chae, Heeyeop;
  • Kim, Chang Koo
  • 2023-08-01
  • Coatings, Vol.13
  • Multidisciplinary Digital Publishing Institute (MDPI)
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether
  • 2019-01-01
  • Thin Solid Films, Vol.669, pp.262-268
  • Elsevier B.V.
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
  • 2020-04-01
  • Applied Surface Science, Vol.508
  • Elsevier B.V.
Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiCoa mark
  • 2024-05-01
  • Korean Journal of Chemical Engineering, Vol.41, pp.1307-1310
  • Springer
Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasmaoa mark
  • 2024-08-01
  • Materials, Vol.17
  • Multidisciplinary Digital Publishing Institute (MDPI)
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