Ajou University repository

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Showing results 1 to 10 of 1921 (Search time: 0.0 seconds).

Auto-masked surface texturing of kerf-loss free silicon wafers using hexafluoroisopropanol in a capacitively coupled plasma etching system
  • 2019-01-01
  • ECS Journal of Solid State Science and Technology, Vol.8, pp.Q76-Q79
  • Electrochemical Society Inc.
Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasmaoa mark
  • 2024-08-01
  • Materials, Vol.17
  • Multidisciplinary Digital Publishing Institute (MDPI)
Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2and Si3N4Films
  • Kim, Yongjae;
  • Kim, Seoeun;
  • Kang, Hojin;
  • You, Sanghyun;
  • Kim, Changkoo;
  • Chae, Heeyeop
  • 2022-08-15
  • ACS Sustainable Chemistry and Engineering, Vol.10, pp.10537-10546
  • American Chemical Society
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
  • 2023-04-24
  • ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
  • American Chemical Society
Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiCoa mark
  • 2024-05-01
  • Korean Journal of Chemical Engineering, Vol.41, pp.1307-1310
  • Springer
Controlling Bowing and Narrowing in SiO2 Contact-Hole Etch Profiles Using Heptafluoropropyl Methyl Ether as an Etchant with Low Global Warming Potentialoa mark
  • You, Sanghyun;
  • Yang, Hyun Seok;
  • Jeon, Dongjun;
  • Chae, Heeyeop;
  • Kim, Chang Koo
  • 2023-08-01
  • Coatings, Vol.13
  • Multidisciplinary Digital Publishing Institute (MDPI)
Carbon negative methanol production for CO2 utilization: Process design and 4E analysis
  • Tang, Zongyue;
  • Zhang, Leiyu;
  • Wang, Lei;
  • Gao, Ruxing;
  • Jun, Ki Won;
  • Kim, Seok Ki;
  • Zhang, Chundong;
  • Yang, Yingju;
  • Wan, Hui;
  • Guan, Guofeng
  • 2024-12-30
  • Energy, Vol.313
  • Elsevier Ltd
Heptafluoroisopropyl methyl ether를 이용한 SiC 플라즈마 식각
  • 선은재
  • 2023-02
  • The Graduate School, Ajou University
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