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to 10 of 1921 (Search time: 0.0 seconds).
Auto-masked surface texturing of kerf-loss free silicon wafers using hexafluoroisopropanol in a capacitively coupled plasma etching system
Kim, Suhyun;
Park, Jin Su;
Kim, Jun Hyun;
Kim, Chang Koo
;
Kim, Jihyun
2019-01-01
ECS Journal of Solid State Science and Technology, Vol.8, pp.Q76-Q79
Electrochemical Society Inc.
Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma
oa mark
You, Sanghyun;
Sun, Eunjae;
Chae, Heeyeop;
Kim, Chang Koo
2024-08-01
Materials, Vol.17
Multidisciplinary Digital Publishing Institute (MDPI)
Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2and Si3N4Films
Kim, Yongjae;
Kim, Seoeun;
Kang, Hojin;
You, Sanghyun;
Kim, Changkoo
;
Chae, Heeyeop
2022-08-15
ACS Sustainable Chemistry and Engineering, Vol.10, pp.10537-10546
American Chemical Society
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
Kim, Yongjae;
Kang, Hojin;
Kim, Changkoo
;
Chae, Heeyeop
2023-04-24
ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
American Chemical Society
Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiC
oa mark
You, Sanghyun;
Sun, Eun Jae;
Hwang, Yujeong;
Kim, Chang Koo
2024-05-01
Korean Journal of Chemical Engineering, Vol.41, pp.1307-1310
Springer
Controlling Bowing and Narrowing in SiO2 Contact-Hole Etch Profiles Using Heptafluoropropyl Methyl Ether as an Etchant with Low Global Warming Potential
oa mark
You, Sanghyun;
Yang, Hyun Seok;
Jeon, Dongjun;
Chae, Heeyeop;
Kim, Chang Koo
2023-08-01
Coatings, Vol.13
Multidisciplinary Digital Publishing Institute (MDPI)
Carbon negative methanol production for CO2 utilization: Process design and 4E analysis
Tang, Zongyue;
Zhang, Leiyu;
Wang, Lei;
Gao, Ruxing;
Jun, Ki Won;
Kim, Seok Ki
;
Zhang, Chundong;
Yang, Yingju;
Wan, Hui;
Guan, Guofeng
2024-12-30
Energy, Vol.313
Elsevier Ltd
Heptafluoroisopropyl methyl ether를 이용한 SiC 플라즈마 식각
선은재
2023-02
The Graduate School, Ajou University
난분해성 사불화탄소(CF4) 제거를 위한 저전력 열 플라즈마 시스템 최적화 및 분해특성 연구
황상연
2021-02
The Graduate School, Ajou University
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Lee, Kyo-Beum
56
Yu, Hak Ki
49
SEO, HYUNGTAK
40
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35
Kim, Jong Hyun
29
LEE, Jaehyun
29
Cho, In Sun
22
Jeon, Jiho
22
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nonlinear optics
8
reliability
8
CRISPR/Cas9
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graphene
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Internet of Things
7
IoT
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apoptosis
6
chemical vapor deposition
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induction motor
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2000 - 2009
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IEEE Access
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Applied Surface Science
16
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Journal of Power Electronics
13
Scientific Reports
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ACS Applied Materials and Interfaces
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