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to 10 of 3547 (Search time: 0.0 seconds).
Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiC
oa mark
You, Sanghyun;
Sun, Eun Jae;
Hwang, Yujeong;
Kim, Chang Koo
2024-05-01
Korean Journal of Chemical Engineering, Vol.41, pp.1307-1310
Springer
Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma
oa mark
You, Sanghyun;
Sun, Eunjae;
Chae, Heeyeop;
Kim, Chang Koo
2024-08-01
Materials, Vol.17
Multidisciplinary Digital Publishing Institute (MDPI)
Controlling Bowing and Narrowing in SiO2 Contact-Hole Etch Profiles Using Heptafluoropropyl Methyl Ether as an Etchant with Low Global Warming Potential
oa mark
You, Sanghyun;
Yang, Hyun Seok;
Jeon, Dongjun;
Chae, Heeyeop;
Kim, Chang Koo
2023-08-01
Coatings, Vol.13
Multidisciplinary Digital Publishing Institute (MDPI)
Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2and Si3N4Films
Kim, Yongjae;
Kim, Seoeun;
Kang, Hojin;
You, Sanghyun;
Kim, Changkoo
;
Chae, Heeyeop
2022-08-15
ACS Sustainable Chemistry and Engineering, Vol.10, pp.10537-10546
American Chemical Society
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
Kim, Yongjae;
Kang, Hojin;
Kim, Changkoo
;
Chae, Heeyeop
2023-04-24
ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
American Chemical Society
Auto-masked surface texturing of kerf-loss free silicon wafers using hexafluoroisopropanol in a capacitively coupled plasma etching system
Kim, Suhyun;
Park, Jin Su;
Kim, Jun Hyun;
Kim, Chang Koo
;
Kim, Jihyun
2019-01-01
ECS Journal of Solid State Science and Technology, Vol.8, pp.Q76-Q79
Electrochemical Society Inc.
ASSESSMENT OF CO2 SEQUESTRATION POTENTIAL OF AFFORESTATION PROJECTS UNDER THE FOREST INVESTMENT PROGRAM (FIP) IN GHANA
KAYANG DAVID MWINFANG
2021-02
Graduate School of International Studies Ajou University
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
Kim, Jun Hyun;
Park, Jin Su;
Kim, Chang Koo
2020-04-01
Applied Surface Science, Vol.508
Elsevier B.V.
Heptafluoroisopropyl methyl ether를 이용한 SiC 플라즈마 식각
선은재
2023-02
The Graduate School, Ajou University
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