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Showing results 1 to 10 of 824 (Search time: 0.0 seconds).

Molecular Layer Deposition of Organic-Inorganic Hafnium Oxynitride Hybrid Films for Electrochemical Applications
  • Ablat, Hayrensa;
  • Oh, Il Kwon;
  • Richey, Nathaniel E.;
  • Oyakhire, Solomon T.;
  • Yang, Yufei;
  • Zhang, Wenbo;
  • Huang, William;
  • Cui, Yi;
  • Bent, Stacey F.
  • 2023-06-12
  • ACS Applied Energy Materials, Vol.6, pp.5806-5816
  • American Chemical Society
Room temperature deposited highly conductive HfNx films for high-performance HfN/Si junction diodes
  • 2024-10-01
  • Surfaces and Interfaces, Vol.53
  • Elsevier B.V.
Ultrafast hot-electron injection at HfN-metal oxide heterojunctions: Role of barrier height
  • Singh, Ranveer;
  • Sial, Qadeer Akbar;
  • Kim, Unjeong;
  • Nah, Sanghee;
  • Seo, Hyungtak
  • 2022-12-01
  • Materials Science in Semiconductor Processing, Vol.152
  • Elsevier Ltd
The role of hydrogen in the nitriding of anatase TiO 2 films in the N 2 -H 2 microwave afterglows
  • Ryu, Seol;
  • Wang, Yunfei;
  • Ricard, Andre;
  • Sarrette, Jean Philippe;
  • Kim, Ansoon;
  • Kim, Yu Kwon
  • 2019-04-25
  • Surface and Coatings Technology, Vol.364, pp.341-346
  • Elsevier B.V.
Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputteroa mark
  • 2024-09-01
  • Nanomaterials, Vol.14
  • Multidisciplinary Digital Publishing Institute (MDPI)
Low-Temperature Direct Growth of Amorphous Boron Nitride Films for High-Performance Nanoelectronic Device Applicationsoa mark
  • Sattari-Esfahlan, Seyed Mehdi;
  • Kim, Hyoung Gyun;
  • Hyun, Sang Hwa;
  • Choi, Jun Hui;
  • Hwang, Hyun Sik;
  • Kim, Eui Tae;
  • Park, Hyeong Gi;
  • Lee, Jae Hyun
  • 2023-02-08
  • ACS Applied Materials and Interfaces, Vol.15, pp.7274-7281
  • American Chemical Society
Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structuresoa mark
  • Dongquoc, Viet;
  • Seo, Dong Bum;
  • Anh, Cao Viet;
  • Lee, Jae Hyun;
  • Park, Jun Hong;
  • Kim, Eui Tae
  • 2022-10-01
  • Applied Sciences (Switzerland), Vol.12
  • MDPI
Effects of plasma power on ferroelectric properties of HfO2-ZrO2 nanolaminates produced by plasma enhanced atomic layer deposition
  • 2023-04-01
  • Surfaces and Interfaces, Vol.37
  • Elsevier B.V.
RF Sputtering으로 성장한 Zinc Nitride(ZnN) 특성 연구
  • 최재원 저
  • 2018-08
  • The Graduate School, Ajou University
Multilevel Nonvolatile Memory by CMOS-Compatible and Transfer-free Amorphous Boron Nitride Filmoa mark
  • Sattari-Esfahlan, Seyed Mehdi;
  • Hyun, Sang Hwa;
  • Moon, Ji Yun;
  • Heo, Keun;
  • Lee, Jae Hyun
  • 2024-11-26
  • ACS Applied Electronic Materials, Vol.6, pp.7781-7790
  • American Chemical Society
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