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Showing results 1 to 10 of 113 (Search time: 0.0 seconds).

Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasmaoa mark
  • 2024-08-01
  • Materials, Vol.17
  • Multidisciplinary Digital Publishing Institute (MDPI)
Heptafluoroisopropyl methyl ether를 이용한 SiC 플라즈마 식각
  • 선은재
  • 2023-02
  • The Graduate School, Ajou University
Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiCoa mark
  • 2024-05-01
  • Korean Journal of Chemical Engineering, Vol.41, pp.1307-1310
  • Springer
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
  • 2020-04-01
  • Applied Surface Science, Vol.508
  • Elsevier B.V.
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
  • 2023-04-24
  • ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
  • American Chemical Society
Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2and Si3N4Films
  • Kim, Yongjae;
  • Kim, Seoeun;
  • Kang, Hojin;
  • You, Sanghyun;
  • Kim, Changkoo;
  • Chae, Heeyeop
  • 2022-08-15
  • ACS Sustainable Chemistry and Engineering, Vol.10, pp.10537-10546
  • American Chemical Society
Controlling Bowing and Narrowing in SiO2 Contact-Hole Etch Profiles Using Heptafluoropropyl Methyl Ether as an Etchant with Low Global Warming Potentialoa mark
  • You, Sanghyun;
  • Yang, Hyun Seok;
  • Jeon, Dongjun;
  • Chae, Heeyeop;
  • Kim, Chang Koo
  • 2023-08-01
  • Coatings, Vol.13
  • Multidisciplinary Digital Publishing Institute (MDPI)
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether
  • 2019-01-01
  • Thin Solid Films, Vol.669, pp.262-268
  • Elsevier B.V.
1,1,2,2-Tetrafluoroethyl 2,2,2-trifluoroethyl ether 플라즈마를 이용한 silicon dioxide 식각
  • 이일형
  • 2020-02
  • The Graduate School, Ajou University
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