Ajou University repository

  • Results/Page
  • Sort by
  • In order
  • Authors/record

Showing results 1 to 10 of 35 (Search time: 0.0 seconds).

Endo and Exo Diels-Alder Adducts: Temperature-Tunable Building Blocks for Selective Chemical Functionalizationoa mark
  • Discekici, Emre H.;
  • St. Amant, Andre H.;
  • Nguyen, Shay N.;
  • Lee, In Hwan;
  • Hawker, Craig J.;
  • Read De Alaniz, Javier
  • 2018-04-18
  • Journal of the American Chemical Society, Vol.140, pp.5009-5013
  • American Chemical Society
Exploring the conformational space of cobalt(III)–salen catalyst for CO2/epoxide copolymerization: Effect of quaternary ammonium salts on preference of alternative isomers
  • 2018-09-05
  • Journal of Computational Chemistry, Vol.39, pp.1854-1867
  • John Wiley and Sons Inc.
Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2and Si3N4Films
  • Kim, Yongjae;
  • Kim, Seoeun;
  • Kang, Hojin;
  • You, Sanghyun;
  • Kim, Changkoo;
  • Chae, Heeyeop
  • 2022-08-15
  • ACS Sustainable Chemistry and Engineering, Vol.10, pp.10537-10546
  • American Chemical Society
(±)-6-epi-goniothalesdiol과 (±)-parvistone E의 입체선택적 전합성
  • 이량하
  • 2019--2
  • The Graduate School, Ajou University
Dithieno[3,2-f:2′,3′-h]quinoxaline-Based Photovoltaic–Thermoelectric Dual-Functional Energy-Harvesting Wide-Bandgap Polymer and its Backbone Isomer
  • Yoon, Seong Jun;
  • Choi, Kang Suh;
  • Zhong, Lian;
  • Jeong, Seonghun;
  • Cho, Yongjoon;
  • Jung, Sungwoo;
  • Yoon, Sang Eun;
  • Kim, Jong H.;
  • Yang, Changduk
  • 2023-07-05
  • Small, Vol.19
  • John Wiley and Sons Inc
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
  • 2023-04-24
  • ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
  • American Chemical Society
3-aminophenol과 그의 클러스터에 관한 분광학적 연구
  • 김상수
  • 2011-02
  • The Graduate School, Ajou University
1 2 3 4