Ajou University repository

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Showing results 1 to 10 of 2045 (Search time: 0.0 seconds).

Toward Advanced High-k and Electrode Thin Films for DRAM Capacitors via Atomic Layer Deposition
  • Kim, Se Eun;
  • Sung, Ju Young;
  • Jeon, Jae Deock;
  • Jang, Seo Young;
  • Lee, Hye Min;
  • Moon, Sang Mo;
  • Kang, Jun Goo;
  • Lim, Han Jin;
  • Jung, Hyung Suk;
  • Lee, Sang Woon
  • 2023-10-24
  • Advanced Materials Technologies, Vol.8
  • John Wiley and Sons Inc
Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices
  • Choi, Ae Rim;
  • Lim, Dong Hyun;
  • Shin, So Yeon;
  • Kang, Hye Joo;
  • Kim, Dohee;
  • Kim, Ja Yong;
  • Ahn, Youngbae;
  • Ryu, Seung Wook;
  • Oh, Il Kwon
  • 2024-03-12
  • Chemistry of Materials, Vol.36, pp.2194-2219
  • American Chemical Society
Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review
  • Kim, Se Eun;
  • Sung, Ju Young;
  • Yun, Yewon;
  • Jeon, Byeongjun;
  • Moon, Sang Mo;
  • Lee, Han Bin;
  • Lee, Chae Hyun;
  • Jung, Hae Jun;
  • Lee, Jae Ung;
  • Lee, Sang Woon
  • 2024-08-01
  • Current Applied Physics, Vol.64, pp.8-15
  • Elsevier B.V.
산화물 접합 계면에 존재하는 2차원 전자 기체 제어와 전자 이동도 연구
  • 고창희
  • 2022-02
  • The Graduate School, Ajou University
Area-Selective Atomic Layer Deposition for Resistive Random-Access Memory Devices
  • Oh, Il Kwon;
  • Khan, Asir Intisar;
  • Qin, Shengjun;
  • Lee, Yujin;
  • Wong, H. S.Philip;
  • Pop, Eric;
  • Bent, Stacey F.
  • 2023-09-13
  • ACS Applied Materials and Interfaces, Vol.15, pp.43087-43093
  • American Chemical Society
An Efficient and Reliable Flash Translation Layer for Chip-Level-Parallel Flash Memory
  • Kwon, Se Jin
  • 2012-08
  • The Graduate School, Ajou University
Interfacial engineering of ZrO2 metal-insulator-metal capacitor using Al2O3/TiO2 buffer layer for improved leakage propertiesoa mark
  • 2022-01-01
  • Journal of Asian Ceramic Societies, Vol.10, pp.649-659
  • Taylor and Francis Ltd.
Study of Metal–Dielectric Interface for Improving Electrical Properties and Reliability of DRAM Capacitor
  • Lim, Han Jin;
  • Choi, Jae Hyoung;
  • Cho, Gihee;
  • Chang, Jaewan;
  • Kim, Younsoo;
  • Jung, Hyung Suk;
  • Shin, Kyoung Sub;
  • Seo, Hyungtak;
  • Jeon, Hyeongtag
  • 2023-10-24
  • Advanced Materials Technologies, Vol.8
  • John Wiley and Sons Inc
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