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Showing results 1 to 10 of 3500 (Search time: 0.0 seconds).

Optimal Powder Deposition Process to Develop a New Direct-Write Additive Manufacturing System
  • 2019-06-01
  • International Journal of Precision Engineering and Manufacturing, Vol.20, pp.1057-1067
  • SpringerOpen
Influences of Process Temperature on a Phase of Ga2O3 Thin Films Grown by Atomic Layer Deposition on Sapphire
  • 2020-12-01
  • Bulletin of the Korean Chemical Society, Vol.41, pp.1190-1193
  • Wiley Blackwell
Design of rotatable direct energy deposition optical system
  • 2019-04-01
  • Journal of Mechanical Science and Technology, Vol.33, pp.1833-1839
  • Korean Society of Mechanical Engineers
Friction and wear behavior of direct metal deposition on Suh3oa mark
  • 2019-01-01
  • Archives of Metallurgy and Materials, Vol.64, pp.841-844
  • Polish Academy of Sciences
Si precursor inhibitors for area selective deposition of Ru
  • Gu, Bonwook;
  • Yasmeen, Sumaira;
  • Oh, Geun Ha;
  • Oh, Il Kwon;
  • Kang, Youngho;
  • Lee, Han Bo Ram
  • 2024-10-01
  • Applied Surface Science, Vol.669
  • Elsevier B.V.
Solvent-Free Aerosol Deposition for Highly Luminescent and Thermally Stable Perovskite-Ceramic Nanocomposite Film
  • Kim, Sunghoon;
  • Cho, Myung Yeon;
  • Kim, Ik Soo;
  • Kim, Won Jung;
  • Park, Sung Han;
  • Baek, Seungmin;
  • Oh, Jong Min;
  • Kim, Sang Wook
  • 2019-07-09
  • Advanced Materials Interfaces, Vol.6
  • Wiley-VCH Verlag
Evaluating effectiveness of dust by-product treatment with scrubbers to mitigate explosion risk in ZrO2 atomic layer deposition process
  • 2020-12-05
  • Journal of Hazardous Materials, Vol.400
  • Elsevier B.V.
Characterization of vacuum-deposited and solution-processed N, N′-bis-(1-naphthyl)-N, N′-diphenyl-1, 1′-biphenyl-4, 4′-diamine hole transport layers based organic light emitting devices
  • 2021-01-01
  • Optical Materials, Vol.111
  • Elsevier B.V.
Laser Cladding of Al 102 Powder on Al 4047 with Direct Energy Depositionoa mark
  • 2023-05-01
  • Metals, Vol.13
  • MDPI
Vanadium oxide thin film deposited on Si by atomic layer deposition for non-volatile resistive switching memory devices
  • 2023-12-01
  • Applied Surface Science, Vol.639
  • Elsevier B.V.
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