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Showing results 1 to 10 of 3953 (Search time: 0.0 seconds).

Area-Selective Atomic Layer Deposition for Resistive Random-Access Memory Devices
  • Oh, Il Kwon;
  • Khan, Asir Intisar;
  • Qin, Shengjun;
  • Lee, Yujin;
  • Wong, H. S.Philip;
  • Pop, Eric;
  • Bent, Stacey F.
  • 2023-09-13
  • ACS Applied Materials and Interfaces, Vol.15, pp.43087-43093
  • American Chemical Society
Si precursor inhibitors for area selective deposition of Ru
  • Gu, Bonwook;
  • Yasmeen, Sumaira;
  • Oh, Geun Ha;
  • Oh, Il Kwon;
  • Kang, Youngho;
  • Lee, Han Bo Ram
  • 2024-10-01
  • Applied Surface Science, Vol.669
  • Elsevier B.V.
Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
  • Lee, Yujin;
  • Seo, Seunggi;
  • Nam, Taewook;
  • Lee, Hyunho;
  • Yoon, Hwi;
  • Sun, Sangkyu;
  • Oh, Il Kwon;
  • Lee, Sanghun;
  • Shong, Bonggeun;
  • Seo, Jin Hyung;
  • Seok, Jang Hyeon;
  • Kim, Hyungjun
  • 2021-12-01
  • Applied Surface Science, Vol.568
  • Elsevier B.V.
Large-Area Structure-Selective Synthesis of Symmetry-Broken MoSe2 and Their Broadband Nonlinear Optical Response
  • 2023-06-19
  • Advanced Optical Materials, Vol.11
  • John Wiley and Sons Inc
Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films
  • Lee, Yujin;
  • Kim, Kangsik;
  • Lee, Zonghoon;
  • Lee, Hong Sub;
  • Lee, Han Bo Ram;
  • Kim, Woo Hee;
  • Oh, Il Kwon;
  • Kim, Hyungjun
  • 2023-03-28
  • Chemistry of Materials, Vol.35, pp.2312-2320
  • American Chemical Society
MIT characteristic of VO2 thin film deposited by ALD using vanadium oxytriisopropoxide precursor and H2O reactant
  • Shin, Changhee;
  • Lee, Namgue;
  • Choi, Hyeongsu;
  • Park, Hyunwoo;
  • Jung, Chanwon;
  • Song, Seokhwi;
  • Yuk, Hyunwoo;
  • Kim, Youngjoon;
  • Kim, Jong Woo;
  • Kim, Keunsik;
  • Choi, Youngtae;
  • Seo, Hyungtak;
  • Jeon, Hyeongtag
  • 2019-10-01
  • Journal of Ceramic Processing Research, Vol.20, pp.484-489
  • Hanyang University
Highly flexible deep-ultraviolet photodetectors using amorphous gallium oxide thin films grown by atomic layer deposition
  • 2022-12-01
  • Materials Today Communications, Vol.33
  • Elsevier Ltd
Sub-microsecond response time deep-ultraviolet photodetectors using α-Ga2O3 thin films grown via low-temperature atomic layer deposition
  • Lee, Seung Hyun;
  • Lee, Kang Min;
  • Kim, Young Bin;
  • Moon, Yoon Jong;
  • Kim, Soo Bin;
  • Bae, Dukkyu;
  • Kim, Tae Jung;
  • Kim, Young Dong;
  • Kim, Sun Kyung;
  • Lee, Sang Woon
  • 2019-04-05
  • Journal of Alloys and Compounds, Vol.780, pp.400-407
  • Elsevier Ltd
Vanadium oxide thin film deposited on Si by atomic layer deposition for non-volatile resistive switching memory devices
  • 2023-12-01
  • Applied Surface Science, Vol.639
  • Elsevier B.V.
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