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to 10 of 483 (Search time: 0.0 seconds).
N2/Ar plasma induces necroptosis and regulates anti inflammatory responses in HNC
최재훈
2021-02
The Graduate School, Ajou University
Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiC
oa mark
You, Sanghyun;
Sun, Eun Jae;
Hwang, Yujeong;
Kim, Chang Koo
2024-05-01
Korean Journal of Chemical Engineering, Vol.41, pp.1307-1310
Springer
Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether
You, Sanghyun;
Kim, Jun Hyun;
Kim, Chang Koo
2022-01-01
Korean Journal of Chemical Engineering, Vol.39, pp.63-68
Springer
Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8
oa mark
You, Sanghyun;
Lee, Yu Jong;
Chae, Heeyeop;
Kim, Chang Koo
2022-05-01
Coatings, Vol.12
MDPI
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether
Kim, Jun Hyun;
Park, Jin Su;
Kim, Chang Koo
2019-01-01
Thin Solid Films, Vol.669, pp.262-268
Elsevier B.V.
Effect of the Plasma Gas Type on the Surface Characteristics of 3Y‐TZP Ceramic
oa mark
Kang, Sung Un;
Kim, Chul Ho;
Kim, Hee Kyung;
Yoon, Ye Won;
Kim, Yu Kwon
;
Kim, Seung Joo
2022-03-01
International Journal of Molecular Sciences, Vol.23
MDPI
Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma
oa mark
You, Sanghyun;
Sun, Eunjae;
Chae, Heeyeop;
Kim, Chang Koo
2024-08-01
Materials, Vol.17
Multidisciplinary Digital Publishing Institute (MDPI)
Heptafluoroisopropyl methyl ether를 이용한 SiC 플라즈마 식각
선은재
2023-02
The Graduate School, Ajou University
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
Kim, Jun Hyun;
Park, Jin Su;
Kim, Chang Koo
2020-04-01
Applied Surface Science, Vol.508
Elsevier B.V.
Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
Koh, Kyongbeom;
Kim, Yongjae;
Kim, Chang Koo
;
Chae, Heeyeop
2018-01-01
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36
AVS Science and Technology Society
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12
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11
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Park, Ikmo
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