Ajou University repository

Current Applied Physics
ISSN
  • E1878-1675
  • P1567-1739
Publisher

The Korean Physical Society

Listed on
(Coverage)

JCR2004-2023

SJR2002-2020;2022-2023

CiteScore2011-2023

SCI2010-2019

SCIE2010-2024

CC2016-2024

SCOPUS2017-2024

KCI(Ranking)2009-2023

KCI2008-2025

KCI(Candidate)2003-2007

Active
Active

based on the information

  • SCOPUS:2024-10
Country
SOUTH KOREA
Aime & Scopes
Current Applied Physics (Curr. Appl. Phys.) is a monthly published international journal covering all the fields of applied science investigating the physics of the advanced materials for future applications. Other areas covered: Experimental and theoretical aspects of advanced materials and devices dealing with synthesis or structural chemistry, physical and electronic properties, photonics, engineering applications, and uniquely pertinent measurement or analytical techniques. Current Applied Physics, published since 2001, covers physics, chemistry and materials science, including bio-materials, with their engineering aspects. It is a truly interdisciplinary journal opening a forum for scientists of all related fields, a unique point of the journal discriminating it from other worldwide and/or Pacific Rim applied physics journals.
Homepage
https://www.sciencedirect.com/journal/current-applied-physics 
Article List

Showing results 1 to 12 of 12

Machine learning-enhanced design of lead-free halide perovskite materials using density functional theory
  • Kumar, Upendra;
  • Kim, Hyeon Woo;
  • Maurya, Gyanendra Kumar;
  • Raj, Bincy Babu;
  • Singh, Sobhit;
  • Kushwaha, Ajay Kumar;
  • Cho, Sung Beom;
  • Ko, Hyunseok
  • 2025-01-01
  • Current Applied Physics, Vol.69, pp.1-7
  • Elsevier B.V.
Hyperspectral microscopy of atomically thin materials
  • 2024-12-01
  • Current Applied Physics, Vol.68, pp.20-25
  • Elsevier B.V.
Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review
  • Kim, Se Eun;
  • Sung, Ju Young;
  • Yun, Yewon;
  • Jeon, Byeongjun;
  • Moon, Sang Mo;
  • Lee, Han Bin;
  • Lee, Chae Hyun;
  • Jung, Hae Jun;
  • Lee, Jae Ung;
  • Lee, Sang Woon
  • 2024-08-01
  • Current Applied Physics, Vol.64, pp.8-15
  • Elsevier B.V.
Fabrication of agar-based tissue-mimicking phantom for the technical evaluation of biomedical optical imaging systemsoa mark
  • Kim, Mingyu;
  • Im, Seonghui;
  • Park, Inyoung;
  • Kim, Donghyeok;
  • Kim, Eun Su;
  • Joseph, James;
  • Yoon, Jonghee
  • 2024-05-01
  • Current Applied Physics, Vol.61, pp.80-85
  • Elsevier B.V.
Recent technical advancements in ARPES: Unveiling quantum materialsoa mark
  • Lim, Chan young;
  • Kim, Sunghun;
  • Jung, Sung Won;
  • Hwang, Jinwoong;
  • Kim, Yeongkwan
  • 2024-04-01
  • Current Applied Physics, Vol.60, pp.43-56
  • Elsevier B.V.
Low-frequency noise behaviors of quasi-two-dimensional electron systems based on complex oxide heterostructuresoa mark
  • 2024-03-01
  • Current Applied Physics, Vol.59, pp.129-135
  • Elsevier B.V.
Flexoelectric effect driven colossal triboelectricity with multilayer graphene
  • 2021-12-01
  • Current Applied Physics, Vol.32, pp.59-65
  • Elsevier B.V.
Correlation of band electronic structure with efficiency in perovskite solar cells with vanadium (Ⅳ) oxide thin film buffers
  • 2021-03-01
  • Current Applied Physics, Vol.23, pp.62-67
  • Elsevier B.V.
Large-scale chemical vapor deposition growth of highly crystalline MoS2 thin films on various substrates and their optoelectronic properties
  • 2019-10-01
  • Current Applied Physics, Vol.19, pp.1127-1131
  • Elsevier B.V.
Electronic band alignment in AlGaN/GaN high electron-mobility transistors investigated using scanning photocurrent microscopy
  • Kim, Y. C.;
  • Son, B. H.;
  • Jeong, H. Y.;
  • Park, K. H.;
  • Ahn, Y. H.
  • 2019-04-01
  • Current Applied Physics, Vol.19, pp.406-410
  • Elsevier B.V.
The migration of alkali metal (Na + , Li + , and K + ) ions in single crystalline vanadate nanowires: Rasch-Hinrichsen resistivity
  • Lee, Yejung;
  • Ye, Byeong Uk;
  • Lee, Dong Kyu;
  • Baik, Jeong Min;
  • Yu, Hak Ki;
  • Kim, Myung Hwa
  • 2019-04-01
  • Current Applied Physics, Vol.19, pp.516-520
  • Elsevier B.V.
Electrical properties of ion gels based on PVDF-HFP applicable as gate stacks for flexible devices
  • 2018-05-01
  • Current Applied Physics, Vol.18, pp.500-504
  • Elsevier B.V.
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