Ajou University repository

ECS Journal of Solid State Science and Technology
ISSN
  • E2162-8777
  • P2162-8769
Publisher

Electrochemical Society, Inc.

Listed on
(Coverage)

JCR2013-2023

SJR2013-2020;2022-2023

CiteScore2012-2023

SCIE2013-2024

CC2016-2024

SCOPUS2017-2024

Active
Active

based on the information

  • SCOPUS:2024-10
Country
USA
Aime & Scopes
The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012. JSS covers fundamental and applied areas ofsolid state science and technology including experimental and theoretical aspects of the chemistry and physics of materialsand devices. Articles are published online as soon as possible after undergoing the peer-review process. The online versionis considered the final version and is fully citable with articles assigned specific page numbers within specific issues.The date of online publication is the official publication date of record. Technical Interest Areas Papers are selected by a prestigious group of Technical Editors, responsible for the following interest areas: •Carbon Nanostructures and Devices •Dielectric Science and Materials •Electronic Materials and Processing •Electronic and Photonic Devices and Systems •Luminescence and Display Materials, Devices, and Processing •Physical Sensors Of particular interest are the areas of solid state materials and device processing as they relate to the establishmentof electrical, optical, physical and chemical properties, the relationship of material properties to device properties, theprocess science and technology of materials and devices, and the characterization of bulk materials, thin films, interfaces,surfaces, and devices. Specific topics of interest to JSS are nanostructures, semiconductors, metals, dielectrics, polymers, electronics, photonics,magnetics, and luminescence, along with related processing methods such as material patterning, growth and deposition, andsurface cleaning, functionalization, modification, and polishing. Device interests include biomedical, sensors, MEMS, NEMS,reliability, displays, and photovoltaics. ECS members may download JSS articles using the tokens from their Article Packs. Articles are also available for sale.Contact ECS about to find out about the flexible subscription options – choose from individual titles, print or online, ortake advantage of a single, discounted fee for all ECS Content.
Article List

Showing results 1 to 4 of 4

Auto-masked surface texturing of kerf-loss free silicon wafers using hexafluoroisopropanol in a capacitively coupled plasma etching system
  • 2019-01-01
  • ECS Journal of Solid State Science and Technology, Vol.8 No.4, pp.Q76-Q79
  • Electrochemical Society Inc.
Reducing the optical reflectance of kerf-loss free siliconwafers via auto-masked cf4/o2 plasma etchoa mark
  • 2018-05-16
  • ECS Journal of Solid State Science and Technology, Vol.7 No.5, pp.Q88-Q91
  • Institute of Physics Publishing
Plasma etching of SiO2 using heptafluoropropyl methyl ether and perfluoropropyl vinyl ether
  • 2018-01-01
  • ECS Journal of Solid State Science and Technology, Vol.7 No.11, pp.Q218-Q221
  • Electrochemical Society Inc.
A brief perspective on the fabrication of hierarchical nanostructure for solar water splitting photoelectrochemical cellsoa mark
  • Kwon, Jinhyeong;
  • Cho, Hyunmin;
  • Lee, Habeom;
  • Yeo, Junyeob;
  • Hong, Sukjoon;
  • Han, Seungyong;
  • Ko, Seung Hwan
  • 2018-01-01
  • ECS Journal of Solid State Science and Technology, Vol.7 No.8, pp.Q131-Q135
  • Electrochemical Society Inc.
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