Ajou University repository

Journal of Vacuum Science and Technology A
ISSN
  • E1520-8559
  • P0734-2101
Publisher

American Institute of Physics

Listed on
(Coverage)

JCR1997-2023

SJR1999-2020;2022-2023

CiteScore2011-2023

SCI2010-2019

SCIE2010-2024

CC2016-2024

SCOPUS2017-2024

Active
Active

based on the information

  • SCOPUS:2024-10
Country
USA
Aime & Scopes
In 1983, the two journals, Journal of Vacuum Science and Technology A and B were launched when the original Journal of Vacuum Science and Technology was split. JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas. JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications. The scope includes, but is not limited to, the following topics: /// Applied and fundamental surface science /// Atomic layer deposition /// Electronic and photonic materials and their processing /// Magnetic thin films and interfaces /// Materials and thin films for energy conversion and storage /// Photovoltaics, including inorganic and organic thin-film solar cells /// Plasma science and technology, including plasma-surface interactions, plasma diagnostics plasma deposition and etching, and applications of plasmas to micro- and nanoelectronics /// Surface engineering /// Thin film deposition, etching, properties, and characterization /// Transmission electron microscopy, including in situ methods /// Tribology /// Vacuum science and technology
Article List

Showing results 1 to 3 of 3

Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides
  • Lee, Sanghun;
  • Seo, Seunggi;
  • Lee, Woo Jae;
  • Noh, Wontae;
  • Kwon, Se Hun;
  • Oh, Il Kwon;
  • Kim, Hyungjun
  • 2023-12-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.41 No.6
  • AVS Science and Technology Society
Effects of the generated functional groups by PECVD on adhesiveness of adipose derived mesenchymal stem cells
  • Kwon, Sungyool;
  • Ban, Wonjin;
  • Lim, Hyuna;
  • Seo, Youngsik;
  • Park, Heonyong;
  • Kim, Eun Joo;
  • Cho, Yong Ki;
  • Park, Sang Gyu;
  • Jung, Donggeun
  • 2018-05-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36 No.3
  • AVS Science and Technology Society
Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
  • 2018-01-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36 No.1
  • AVS Science and Technology Society
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