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Anodapter: A Unified Framework for Generating Aligned Anomaly Images and Masks Using Diffusion Models
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dc.contributor.authorShin, Minkyoung-
dc.contributor.authorJeong, Seonggyun-
dc.contributor.authorHeo, Yong Seok-
dc.date.issued2025-01-01-
dc.identifier.issn2169-3536-
dc.identifier.urihttps://aurora.ajou.ac.kr/handle/2018.oak/38343-
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=105005280600&origin=inward-
dc.description.abstractIn industrial manufacturing, anomaly inspection performance is frequently hampered by the scarcity of anomaly data. To address this issue, synthetic anomaly masks and corresponding images are generated using various methods. These methods typically employ separate branches within a single backbone or distinct models for generating anomaly masks and images. However, such approaches frequently result in misalignment between the anomaly mask and image, and a reduction in realism, which adversely affects the performance of downstream tasks. To address these challenges, we introduce Anodapter, a unified few-shot anomaly generation model that utilizes a single diffusion model to sequentially generate well-aligned anomaly masks and images. Unlike earlier models such as AnomalyDiffusion, which use separate models for mask and image generation, Anodapter integrates both tasks into a single diffusion model through its proposed Switch Adapter, eliminating misalignment and improving realism. This unified approach not only enables the alternating generation of masks and images within a single model, but also significantly enhances both precision and realism. The model is designed to facilitate the generation of anomaly images either from generated or user-specified masks, ensuring precise alignment and high-quality results. To achieve this, Anodapter efficiently separates anomaly information into appearance and spatial components. For spatial control, we introduce a Switch Adapter that manages the spatial arrangements of anomalies. This adapter provides targeted conditioning to the backbone diffusion model to generate well-aligned anomaly masks and images. For appearance control, the model employs specialized prompts with unique identifiers, enabling selective generation of anomaly images or masks. These identifiers assist the model in learning the features of anomalous regions and the overall structure of the image. Through extensive experiments with various datasets, including MVTec AD, MVTec LOCO, and BTAD, we demonstrate that our model can generate realistic and diverse anomaly datasets. It significantly outperforms existing methods in downstream tasks such as anomaly detection, localization, and classification, both quantitatively and qualitatively. Specifically, our model achieved state-of-the-art performance, with an image-level AUROC of 98.48% in anomaly detection, a pixel-level AUROC of 98.82% in anomaly localization, and an anomaly classification accuracy of 71.11% on the MVTec AD dataset, surpassing previous approaches.-
dc.description.sponsorshipThis work was supported in part by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education under Grant 2022R1F1A1065702, and in part by the Institute of Information and Communications Technology Planning and Evaluation (IITP) through the Artificial Intelligence Convergence Innovation Human Resources Development Grant funded by Korean Government [Ministry of Science and Information and Communications Technology (MSIT)] under Grant IITP-2025-RS-2023-00255968. The authors would like to thank anonymous reviewers for their constructive comments and suggestions. They declare no conflicts of interest.-
dc.language.isoeng-
dc.publisherInstitute of Electrical and Electronics Engineers Inc.-
dc.subject.meshAnomaly detection-
dc.subject.meshAnomaly generation-
dc.subject.meshAnomaly inspection-
dc.subject.meshDiffusion model-
dc.subject.meshDown-stream-
dc.subject.meshFew-shot image generation-
dc.subject.meshImage generations-
dc.subject.meshIndustrial manufacturing-
dc.subject.meshPerformance-
dc.subject.meshUnified framework-
dc.titleAnodapter: A Unified Framework for Generating Aligned Anomaly Images and Masks Using Diffusion Models-
dc.typeArticle-
dc.citation.endPage83504-
dc.citation.startPage83483-
dc.citation.titleIEEE Access-
dc.citation.volume13-
dc.identifier.bibliographicCitationIEEE Access, Vol.13, pp.83483-83504-
dc.identifier.doi10.1109/access.2025.3568866-
dc.identifier.scopusid2-s2.0-105005280600-
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=6287639-
dc.subject.keywordAnomaly generation-
dc.subject.keywordanomaly inspection-
dc.subject.keywordfew-shot image generation-
dc.type.otherArticle-
dc.identifier.pissn21693536-
dc.subject.subareaComputer Science (all)-
dc.subject.subareaMaterials Science (all)-
dc.subject.subareaEngineering (all)-
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