Etching of Si-based materials using fluorocarbon plasmas : Etch characteristics and its applications - 김준현 (The Graduate School, Ajou University, 2019)
학위논문(박사)--아주대학교 일반대학원 :에너지시스템학과,2019. 2
Keywords: plasma etch; fluorocarbon plasma; Si-based material; etching