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to 10 of 1475 (Search time: 0.0 seconds).
MAX-Phase Films Overcome Scaling Limitations to the Resistivity of Metal Thin Films
Yoo, Joung Eun;
Sung, Ju Young;
Hwang, Jin Ha;
Maeng, Inhee;
Oh, Seung Jae;
Lee, Inho;
Shim, Ji Hoon;
Kim, Sung Dug;
Yoon, Du Seop;
Jang, Seo Young;
Kang, Young Jae;
Lee, Sang Woon
2021-12-29
ACS Applied Materials and Interfaces, Vol.13, pp.61809-61817
American Chemical Society
Micro-networked metal coating using self-cracked WO3 inorganic thin film as sacrificial layer: Application to transparent flexible electrodes
Kim, Noeul;
Kim, Youngho;
Park, Jung Been;
Cho, Hyeon Ho;
Lee, Dong kyu;
Kwak, Geonho;
Yu, Hak Ki
2021-10-31
Thin Solid Films, Vol.736
Elsevier B.V.
Epitaxial growth of NbN thin films for electrodes using atomic layer deposition
Young Jang, Seo;
Min Lee, Hye;
Young Sung, Ju;
Eun Kim, Se;
Deock Jeon, Jae;
Yun, Yewon;
Mo Moon, Sang;
Eun Yoo, Joung;
Hyeon Choi, Ji;
Joo Park, Tae;
Woon Lee, Sang
2023-11-01
Applied Surface Science, Vol.636
Elsevier B.V.
Alternative surface reaction route in the atomic layer deposition of NbN thin films for reduced resistivity
Lee, Hyeok Jae;
Jang, Seo Young;
Lee, Hye Min;
Sung, Ju Young;
Kim, Se Eun;
Jeon, Jae Deock;
Yun, Yewon;
Lee, Sang Woon
2023-08-15
Journal of Alloys and Compounds, Vol.952
Elsevier Ltd
Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structures
oa mark
Dongquoc, Viet;
Seo, Dong Bum;
Anh, Cao Viet;
Lee, Jae Hyun;
Park, Jun Hong;
Kim, Eui Tae
2022-10-01
Applied Sciences (Switzerland), Vol.12
MDPI
Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review
Kim, Se Eun;
Sung, Ju Young;
Yun, Yewon;
Jeon, Byeongjun;
Moon, Sang Mo;
Lee, Han Bin;
Lee, Chae Hyun;
Jung, Hae Jun;
Lee, Jae Ung
;
Lee, Sang Woon
2024-08-01
Current Applied Physics, Vol.64, pp.8-15
Elsevier B.V.
Influences of Process Temperature on a Phase of Ga2O3 Thin Films Grown by Atomic Layer Deposition on Sapphire
Lee, Seung Hyun;
Lee, Kang Min;
Lee, Sang Woon
2020-12-01
Bulletin of the Korean Chemical Society, Vol.41, pp.1190-1193
Wiley Blackwell
Interface and bulk engineering of VO2 thin film deposited on Si for multi-level metal-to-insulator transitions
Choi, Hyobin;
Lee, Wanggon;
Lim, Jaeseong;
Shin, Heecheol;
Kumar, Mohit
;
Seo, Hyungtak
2023-02-15
Applied Surface Science, Vol.611
Elsevier B.V.
Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
Lee, Yujin;
Seo, Seunggi;
Nam, Taewook;
Lee, Hyunho;
Yoon, Hwi;
Sun, Sangkyu;
Oh, Il Kwon
;
Lee, Sanghun;
Shong, Bonggeun;
Seo, Jin Hyung;
Seok, Jang Hyeon;
Kim, Hyungjun
2021-12-01
Applied Surface Science, Vol.568
Elsevier B.V.
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57
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52
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45
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39
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848
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491
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Graphene
18
Powder metallurgy
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High entropy alloy
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Atomic layer deposition
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Microstructure
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graphene
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Photoelectrochemical water splitting
11
Tungsten oxide
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MoS2
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atomic layer deposition
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Applied Surface Science
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Journal of Alloys and Compounds
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Sensors and Actuators, B: Chemical
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Advanced Functional Materials
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Archives of Metallurgy and Materials
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ACS Nano
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