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to 10 of 593 (Search time: 0.0 seconds).
New plasma etching techniques for control over Si and SiO2 etch profiles
조성운
2015-08
The Graduate School, Ajou University
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
Kim, Jun Hyun;
Park, Jin Su;
Kim, Chang Koo
2020-04-01
Applied Surface Science, Vol.508
Elsevier B.V.
Plasma etching of SiO2 using heptafluoropropyl methyl ether and perfluoropropyl vinyl ether
Kim, Jun Hyun;
Park, Jin Su;
Kim, Chang Koo
2018-01-01
ECS Journal of Solid State Science and Technology, Vol.7, pp.Q218-Q221
Electrochemical Society Inc.
Fabrication of High-quality Periodic Ge Nanostructures via Water-based MAC Etching and Their Application for Photovoltaics
윤여준
2022-02
The Graduate School, Ajou University
Auto-masked surface texturing of kerf-loss free silicon wafers using hexafluoroisopropanol in a capacitively coupled plasma etching system
Kim, Suhyun;
Park, Jin Su;
Kim, Jun Hyun;
Kim, Chang Koo
;
Kim, Jihyun
2019-01-01
ECS Journal of Solid State Science and Technology, Vol.8, pp.Q76-Q79
Electrochemical Society Inc.
Substrate-morphology driven tunable nanoscale artificial synapse
oa mark
Iqbal, Shahid;
Kumar, Mohit
;
Singh, Ranveer;
Sial, Qadeer Akbar;
Seo, Hyungtak
2021-01-01
Journal of Asian Ceramic Societies
Taylor and Francis Ltd.
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether
Kim, Jun Hyun;
Park, Jin Su;
Kim, Chang Koo
2019-01-01
Thin Solid Films, Vol.669, pp.262-268
Elsevier B.V.
Surface texturing of si with periodically arrayed oblique nanopillars to achieve antireflection
oa mark
Kim, Jun Hyun;
You, Sanghyun;
Kim, Chang Koo
2021-01-02
Materials, Vol.14, pp.1-9
MDPI AG
Structural and Optical Properties of InGaN/GaN Vertical Light Emitting Diodes from Flat and Patterned Sapphire Substrates
Dung Do Van
2014-08
The Graduate School, Ajou University
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surface modification
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chemical vapor deposition
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