Ajou University repository

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Showing results 1 to 10 of 593 (Search time: 0.0 seconds).

New plasma etching techniques for control over Si and SiO2 etch profiles
  • 조성운
  • 2015-08
  • The Graduate School, Ajou University
Plasma etching of SiO2 using heptafluoropropyl methyl ether and perfluoropropyl vinyl ether
  • 2018-01-01
  • ECS Journal of Solid State Science and Technology, Vol.7, pp.Q218-Q221
  • Electrochemical Society Inc.
Auto-masked surface texturing of kerf-loss free silicon wafers using hexafluoroisopropanol in a capacitively coupled plasma etching system
  • 2019-01-01
  • ECS Journal of Solid State Science and Technology, Vol.8, pp.Q76-Q79
  • Electrochemical Society Inc.
Substrate-morphology driven tunable nanoscale artificial synapseoa mark
  • 2021-01-01
  • Journal of Asian Ceramic Societies
  • Taylor and Francis Ltd.
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether
  • 2019-01-01
  • Thin Solid Films, Vol.669, pp.262-268
  • Elsevier B.V.
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