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Showing results 1 to 10 of 1360 (Search time: 0.0 seconds).

Improved adaptive iterative learning current control approach for IPMSM drives
  • 2023-02-01
  • Journal of Power Electronics, Vol.23, pp.284-295
  • Springer
Torque-Ripple Reduction and Fast Torque Response Strategy for Predictive Torque Control of Induction Motors
  • 2018-03-01
  • IEEE Transactions on Power Electronics, Vol.33, pp.2458-2470
  • Institute of Electrical and Electronics Engineers Inc.
Robust Hybrid Current Control Approach for IPMSM Drives Subjected to System Uncertainty
  • 2024-01-01
  • IEEE Transactions on Industrial Electronics, Vol.71, pp.15532-15542
  • Institute of Electrical and Electronics Engineers Inc.
Plasma etching of SiO2 using heptafluoropropyl methyl ether and perfluoropropyl vinyl ether
  • 2018-01-01
  • ECS Journal of Solid State Science and Technology, Vol.7, pp.Q218-Q221
  • Electrochemical Society Inc.
A Generalized Integrated MPC-Fuzzy-Neural Network Approach for Multilevel Inverter Fed PMSMs
  • 2024-02-01
  • IEEE Transactions on Industrial Informatics, Vol.20, pp.2751-2761
  • IEEE Computer Society
Improved Adaptive CCS-MPCC for Distorted Model Parameters Mitigation of IPMSM Drives
  • 2024-04-01
  • IEEE Transactions on Industrial Electronics, Vol.71, pp.3483-3493
  • Institute of Electrical and Electronics Engineers Inc.
Analysis of Engine Efficiency of Diesel Vehicle in Transient Operating Conditions
  • Chung, In Chun;
  • An, Young Kuk;
  • Park, Jinil;
  • Lee, Jonghwa;
  • Ji, Yohan
  • 2021-08-01
  • International Journal of Automotive Technology, Vol.22, pp.941-947
  • Korean Society of Automotive Engineers
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether
  • 2019-01-01
  • Thin Solid Films, Vol.669, pp.262-268
  • Elsevier B.V.
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
  • 2020-04-01
  • Applied Surface Science, Vol.508
  • Elsevier B.V.
Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas
  • 2020-02-01
  • Korean Journal of Chemical Engineering, Vol.37, pp.374-379
  • Springer
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