Ajou University repository

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Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
  • 2018-01-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36
  • AVS Science and Technology Society
Oxidative coupling of methane over Mn2O3-Na2WO4/SiC catalystsoa mark
  • 2019-04-01
  • Catalysts, Vol.9
  • MDPI
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
  • 2023-04-24
  • ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
  • American Chemical Society
Heptafluoroisopropyl methyl ether를 이용한 SiC 플라즈마 식각
  • 선은재
  • 2023-02
  • The Graduate School, Ajou University
Effects of Na content in Na/Ni/SiO2 and Na/Ni/CeO2 catalysts for CO and CO2 methanation
  • 2018-04-01
  • Catalysis Today, Vol.303, pp.159-167
  • Elsevier B.V.
불순물들의 종류와 농도에 따른 다결정실리콘 박막의 특성
  • 우상호
  • 2008-08
  • The Graduate School, Ajou University
Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8oa mark
  • 2022-05-01
  • Coatings, Vol.12
  • MDPI
Ammonia Decomposition over Ru/SiO2 Catalystsoa mark
  • 2022-10-01
  • Catalysts, Vol.12
  • MDPI
Etching of Si-based materials using fluorocarbon plasmas : Etch characteristics and its applications
  • 김준현
  • 2019-02
  • The Graduate School, Ajou University
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
  • 2020-04-01
  • Applied Surface Science, Vol.508
  • Elsevier B.V.
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