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Up-Scale Synthesis of p-ClC6H4SiR3 by CuCN Catalyzed Coupling Reaction of Grignard Reagents with R3SiCl
  • 고지형
  • 2023-02
  • The Graduate School, Ajou University
Understanding the role of Si alloying on the structural, mechanical, wear and high temperature oxidation behavior of CrFeNiTiX (X=Si) high entropy alloysoa mark
  • Nagarjuna, Cheenepalli;
  • Lee, Hansung;
  • Dewangan, Sheetal Kumar;
  • Rao, K. Raja;
  • Pillai, Gokul M.;
  • Kumar, Vinod;
  • Ahn, Byungmin
  • 2024-11-01
  • Journal of Materials Research and Technology, Vol.33, pp.5119-5135
  • Elsevier Editora Ltda
Effect of Additive Elements (x = Cr, Mn, Zn, Sn) on the Phase Evolution and Thermodynamic Complexity of AlCuSiFe-x High Entropy Alloys Fabricated via Powder Metallurgyoa mark
  • 2022-09-01
  • Metals and Materials International, Vol.28, pp.2216-2224
  • Korean Institute of Metals and Materials
Exploring strengthening mechanism of FeCoNiAl high-entropy alloy by non-metallic silicon addition produced via powder metallurgy
  • 2023-06-25
  • Journal of Alloys and Compounds, Vol.947
  • Elsevier Ltd
Design of dv/dt Filter for Insulation Protection in SiC Inverter-Fed Motor Drive Systems
  • Choi, Hye Won;
  • Bae, Yun Jae;
  • Kang, Yong Jin;
  • Park, Cheol Hyun;
  • Lee, Kyo Beum
  • 2024-01-01
  • Transactions of the Korean Institute of Electrical Engineers, Vol.73, pp.56-62
  • Korean Institute of Electrical Engineers
Active Ni/SiO2 catalysts with high Ni content for benzene hydrogenation and CO methanation
  • 2019-07-05
  • Applied Catalysis A: General, Vol.581, pp.67-73
  • Elsevier B.V.
불포화 불화탄소 플라즈마를 이용한 실리콘 식각에서의 아르곤 첨가효과
  • 지정민
  • 2010-08
  • The Graduate School, Ajou University
Effect of Si alloying on the structural, thermal expansion, and magnetic properties of FeCoNiAlSix high-entropy alloys
  • Nagarjuna, Cheenepalli;
  • Dewangan, Sheetal Kumar;
  • Lee, Hansung;
  • Madavali, Babu;
  • Ahn, Byungmin
  • 2024-03-01
  • Journal of Materials Science, Vol.59, pp.4281-4292
  • Springer
C4F6/Ar/O2 플라즈마에서 CH2F2 첨가에 따른 SiO2와 Si3N4의 식각속도 및 식각선택비의 각도의존성
  • 조성운
  • 2011-02
  • The Graduate School, Ajou University
New plasma etching techniques for control over Si and SiO2 etch profiles
  • 조성운
  • 2015-08
  • The Graduate School, Ajou University
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