Ajou University repository

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Showing results 1 to 10 of 2016 (Search time: 0.0 seconds).

Si precursor inhibitors for area selective deposition of Ru
  • Gu, Bonwook;
  • Yasmeen, Sumaira;
  • Oh, Geun Ha;
  • Oh, Il Kwon;
  • Kang, Youngho;
  • Lee, Han Bo Ram
  • 2024-10-01
  • Applied Surface Science, Vol.669
  • Elsevier B.V.
Area-Selective Atomic Layer Deposition for Resistive Random-Access Memory Devices
  • Oh, Il Kwon;
  • Khan, Asir Intisar;
  • Qin, Shengjun;
  • Lee, Yujin;
  • Wong, H. S.Philip;
  • Pop, Eric;
  • Bent, Stacey F.
  • 2023-09-13
  • ACS Applied Materials and Interfaces, Vol.15, pp.43087-43093
  • American Chemical Society
MIT characteristic of VO2 thin film deposited by ALD using vanadium oxytriisopropoxide precursor and H2O reactant
  • Shin, Changhee;
  • Lee, Namgue;
  • Choi, Hyeongsu;
  • Park, Hyunwoo;
  • Jung, Chanwon;
  • Song, Seokhwi;
  • Yuk, Hyunwoo;
  • Kim, Youngjoon;
  • Kim, Jong Woo;
  • Kim, Keunsik;
  • Choi, Youngtae;
  • Seo, Hyungtak;
  • Jeon, Hyeongtag
  • 2019-10-01
  • Journal of Ceramic Processing Research, Vol.20, pp.484-489
  • Hanyang University
Development of Prediction Model of Coal Ash Fouling Behavior in the Entrained-Flow Gasification Condition through the DTF Experiments
  • 남궁훤
  • 2015-08
  • The Graduate School, Ajou University
Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
  • Lee, Yujin;
  • Seo, Seunggi;
  • Nam, Taewook;
  • Lee, Hyunho;
  • Yoon, Hwi;
  • Sun, Sangkyu;
  • Oh, Il Kwon;
  • Lee, Sanghun;
  • Shong, Bonggeun;
  • Seo, Jin Hyung;
  • Seok, Jang Hyeon;
  • Kim, Hyungjun
  • 2021-12-01
  • Applied Surface Science, Vol.568
  • Elsevier B.V.
Wafer-Scale Growth of 3D Graphene on SiO2by Remote Metal Catalyst-Assisted MOCVD and Its Application as a NO2Gas Sensor
  • Nasir, Tuqeer;
  • Kim, Bum Jun;
  • Lee, Sang Hoon;
  • Jeong, Byung Joo;
  • Cho, Sooheon;
  • Lee, Bom;
  • Yoon, Sang Ok;
  • Jang, Han Eol;
  • Yu, Hak Ki;
  • Choi, Jae Young
  • 2022-07-06
  • Crystal Growth and Design, Vol.22, pp.4192-4202
  • American Chemical Society
차세대 직접 분말 분사 방식 적층 조형 시스템을 위한 통계 분석 기반 최적 분말 분사 조건 결정
  • 이나눔
  • 2017-02
  • The Graduate School, Ajou University
Fabrication of UV-C photodetector with ultimate stability in extreme space environments (radiation, low temperature) using aerosol-deposited Ga2O3oa mark
  • Cho, Hyeon Ho;
  • Lee, Sang Hoon;
  • Kim, Dahoon;
  • Yu, Hak Ki;
  • Choi, Jae Young;
  • Park, Jae Hyuk
  • 2023-09-15
  • Ceramics International, Vol.49, pp.30375-30380
  • Elsevier Ltd
Thermochromic Characteristics of Vanadium Dioxide by Metal Oxide Co-sputtering
  • Choi, Jun Oh
  • 2016-02
  • The Graduate School, Ajou University
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