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to 10 of 872 (Search time: 0.0 seconds).
Plasma atomic layer etching of molybdenum with surface fluorination
Kim, Yongjae;
Kang, Hojin;
Ha, Heeju;
Kim, Changkoo
;
Cho, Sungmin;
Chae, Heeyeop
2023-08-01
Applied Surface Science, Vol.627
Elsevier B.V.
Surface hydrogeneration of vanadium dioxide nanobeam to manipulate insulator-to-metal transition using hydrogen plasma
oa mark
Kang, Hyunwoo;
Ko, Minhwan;
Choi, Hyobin;
Lee, Wanggon;
Singh, Ranveer;
Kumar, Mohit
;
Seo, Hyungtak
2021-01-01
Journal of Asian Ceramic Societies
Taylor and Francis Ltd.
Metal-assisted chemical etching을 이용한 Ge 나노패터닝
정선홍
2016-08
The Graduate School, Ajou University
New plasma etching techniques for control over Si and SiO2 etch profiles
조성운
2015-08
The Graduate School, Ajou University
Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas
Kim, Jun Hyun;
Kim, Chang Koo
2020-02-01
Korean Journal of Chemical Engineering, Vol.37, pp.374-379
Springer
AlGaN 반도체 기반 태양광 블라인드 자외선 C 광 검출기
심영석
2022-02
The Graduate School, Ajou University
Substrate-morphology driven tunable nanoscale artificial synapse
oa mark
Iqbal, Shahid;
Kumar, Mohit
;
Singh, Ranveer;
Sial, Qadeer Akbar;
Seo, Hyungtak
2021-01-01
Journal of Asian Ceramic Societies
Taylor and Francis Ltd.
Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether
You, Sanghyun;
Kim, Jun Hyun;
Kim, Chang Koo
2022-01-01
Korean Journal of Chemical Engineering, Vol.39, pp.63-68
Springer
EPITAXIAL Ge NANO-PILLAR SOLAR CELLS
Nguyen Dinh Lam
2014-02
The Graduate School, Ajou University
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Reactive oxygen species
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crystal structure
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