Ajou University repository

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Showing results 1 to 10 of 1442 (Search time: 0.0 seconds).

Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2and Si3N4Films
  • Kim, Yongjae;
  • Kim, Seoeun;
  • Kang, Hojin;
  • You, Sanghyun;
  • Kim, Changkoo;
  • Chae, Heeyeop
  • 2022-08-15
  • ACS Sustainable Chemistry and Engineering, Vol.10, pp.10537-10546
  • American Chemical Society
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
  • 2023-04-24
  • ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
  • American Chemical Society
불순물들의 종류와 농도에 따른 다결정실리콘 박막의 특성
  • 우상호
  • 2008-08
  • The Graduate School, Ajou University
New plasma etching techniques for control over Si and SiO2 etch profiles
  • 조성운
  • 2015-08
  • The Graduate School, Ajou University
Preparation of a cross-linked cartilage acellular matrix-poly (caprolactone-ran-lactide-ran-glycolide) film and testing its feasibility as an anti-adhesive film
  • Park, Joon Yeong;
  • Park, Seung Hun;
  • Ju, Hyeon Jin;
  • Ji, Yun Bae;
  • Yun, Hee Woong;
  • Min, Byoung Hyun;
  • Kim, Moon Suk
  • 2020-12-01
  • Materials Science and Engineering C, Vol.117
  • Elsevier Ltd
Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structuresoa mark
  • Dongquoc, Viet;
  • Seo, Dong Bum;
  • Anh, Cao Viet;
  • Lee, Jae Hyun;
  • Park, Jun Hong;
  • Kim, Eui Tae
  • 2022-10-01
  • Applied Sciences (Switzerland), Vol.12
  • MDPI
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