Ajou University repository

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Showing results 1 to 10 of 1590 (Search time: 0.0 seconds).

Cellular basis in the inhibitory activity of non-thermal plasma against biofilm-forming pathogenic bacteria
  • 서혜미
  • 2018-08
  • The Graduate School, Ajou University
New plasma etching techniques for control over Si and SiO2 etch profiles
  • 조성운
  • 2015-08
  • The Graduate School, Ajou University
Plasma Surface Modification of 3Y-TZP at Low and Atmospheric Pressures with Different Treatment Timesoa mark
  • 2023-04-01
  • International Journal of Molecular Sciences, Vol.24
  • Multidisciplinary Digital Publishing Institute (MDPI)
Effects of the generated functional groups by PECVD on adhesiveness of adipose derived mesenchymal stem cells
  • Kwon, Sungyool;
  • Ban, Wonjin;
  • Lim, Hyuna;
  • Seo, Youngsik;
  • Park, Heonyong;
  • Kim, Eun Joo;
  • Cho, Yong Ki;
  • Park, Sang Gyu;
  • Jung, Donggeun
  • 2018-05-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36
  • AVS Science and Technology Society
Effect of various storage media on the physicochemical properties of plasma-treated dental zirconiaoa mark
  • 2024-12-01
  • Scientific Reports, Vol.14
  • Nature Research
Human Trial for the Effect of Plasma-Activated Water Spray on Vaginal Cleaning in Patients with Bacterial Vaginosisoa mark
  • 2022-06-18
  • Medical sciences (Basel, Switzerland), Vol.10
  • NLM (Medline)
A passive mitigation strategy of impurity deposition on the first mirrors using duct with baffles: A case study at a port of KSTAR with in-situ deposition monitoring
  • Kim, Boseong;
  • Seon, Changrae;
  • Oh, Soo Ghee;
  • Kim, Yu Kwon;
  • An, Younghwa;
  • Bang, Eunnam;
  • Hong, Suk Ho;
  • Pak, Sunil;
  • Cheon, Munseong;
  • Lee, Hyun Gon
  • 2018-04-01
  • Fusion Engineering and Design, Vol.129, pp.269-276
  • Elsevier Ltd
아르곤 플라즈마와 전리 오존수를 사용한 표면처리 기술의 개발과 응용
  • 한건희
  • 2007-02
  • The Graduate School, Ajou University
바나듐과 질소를 사용하여 산화티타늄과 산화텅스텐 기반으로 제작된 촉매의 반응성을 통한 표면 분석과 플라즈마 프로세스 연구
  • 전병욱
  • 2018-02
  • The Graduate School, Ajou University
Reducing the optical reflectance of kerf-loss free siliconwafers via auto-masked cf4/o2 plasma etchoa mark
  • 2018-05-16
  • ECS Journal of Solid State Science and Technology, Vol.7, pp.Q88-Q91
  • Institute of Physics Publishing
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