Ajou University repository

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Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
  • 2018-01-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36
  • AVS Science and Technology Society
Plasma atomic layer etching of molybdenum with surface fluorination
  • Kim, Yongjae;
  • Kang, Hojin;
  • Ha, Heeju;
  • Kim, Changkoo;
  • Cho, Sungmin;
  • Chae, Heeyeop
  • 2023-08-01
  • Applied Surface Science, Vol.627
  • Elsevier B.V.
전극재료에 따른 대기압 플라즈마 방전특성
  • 공현구
  • 2019-08
  • The Graduate School, Ajou University
Anticancer efficacy of long-term stored plasma-activated mediumoa mark
  • Nguyen, Ngoc Hoan;
  • Park, Hyung Jun;
  • Hwang, Soon Young;
  • Lee, Jong Soo;
  • Yang, Sang Sik
  • 2019-02-25
  • Applied Sciences (Switzerland), Vol.9
  • MDPI AG
Microstructural Evolution of Alcufemnti-0.75Si high entropy alloy processed by mechanical alloying and spark plasma sinteringoa mark
  • Kim, Minsu;
  • Sharma, Ashutosh;
  • Chae, Myoung Jin;
  • Lee, Hansung;
  • Ahn, Byungmin
  • 2021-01-01
  • Archives of Metallurgy and Materials, Vol.66, pp.703-707
  • Polska Akademia Nauk
Surface hydrogeneration of vanadium dioxide nanobeam to manipulate insulator-to-metal transition using hydrogen plasmaoa mark
  • 2021-01-01
  • Journal of Asian Ceramic Societies
  • Taylor and Francis Ltd.
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