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Plasma atomic layer etching of molybdenum with surface fluorination
  • Kim, Yongjae;
  • Kang, Hojin;
  • Ha, Heeju;
  • Kim, Changkoo;
  • Cho, Sungmin;
  • Chae, Heeyeop
  • 2023-08-01
  • Applied Surface Science, Vol.627
  • Elsevier B.V.
Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
  • 2018-01-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36
  • AVS Science and Technology Society
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
  • 2023-04-24
  • ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
  • American Chemical Society
O2 Plasma을 이용한 ALD SEAM 제어 식각 방법
  • 최호진
  • 2023-02
  • The Graduate School, Ajou University
New plasma etching techniques for control over Si and SiO2 etch profiles
  • 조성운
  • 2015-08
  • The Graduate School, Ajou University
실리콘의 원자층식각을 위한 식각제와 이온빔의 선택에 관한 연구
  • 정희석
  • 2005
  • The Graduate School, Ajou University
Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8oa mark
  • 2022-05-01
  • Coatings, Vol.12
  • MDPI
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether
  • 2019-01-01
  • Thin Solid Films, Vol.669, pp.262-268
  • Elsevier B.V.
Recent advances in surface regulation and engineering strategies of photoelectrodes toward enhanced photoelectrochemical water splitting
  • Tan, Runfa;
  • Sivanantham, Arumugam;
  • Jansi Rani, Balasubramanian;
  • Jeong, Yoo Jae;
  • Cho, In Sun
  • 2023-11-01
  • Coordination Chemistry Reviews, Vol.494
  • Elsevier B.V.
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