All
Title
Author
Keyword
Date
All
Communities
Authors
Journal
All of DSpace
Administration
Affiliated Organization
Ajou University
ETC
Graduate School of Ajou University
Professional Graduate Schools
Research Organization
Special Graduate Schools
Supporting Institution
Add filters:
Title
Type
Author
Keyword
Date Issued
Advisor
Abstract
Journal
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Results/Page
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
Sort by
Relevance
Title
Issue Date
In order
Ascending
Descending
Authors/record
All
1
5
10
15
20
25
30
35
40
45
50
Showing results
1
to 10 of 12 (Search time: 0.0 seconds).
Why Perfluorocarbon nanoparticles encounter bottlenecks in clinical translation despite promising oxygen carriers?
De, Anindita;
Jee, Jun Pil;
Park, Young Joon
2024-06-01
European Journal of Pharmaceutics and Biopharmaceutics, Vol.199
Elsevier B.V.
Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8
oa mark
You, Sanghyun;
Lee, Yu Jong;
Chae, Heeyeop;
Kim, Chang Koo
2022-05-01
Coatings, Vol.12
MDPI
Controlling Bowing and Narrowing in SiO2 Contact-Hole Etch Profiles Using Heptafluoropropyl Methyl Ether as an Etchant with Low Global Warming Potential
oa mark
You, Sanghyun;
Yang, Hyun Seok;
Jeon, Dongjun;
Chae, Heeyeop;
Kim, Chang Koo
2023-08-01
Coatings, Vol.13
Multidisciplinary Digital Publishing Institute (MDPI)
Current perspectives of artificial oxygen carriers as red blood cell substitutes: a review of old to cutting-edge technologies using in vitro and in vivo assessments
oa mark
Mohanto, Nijaya;
Park, Young Joon
;
Jee, Jun Pil
2023-01-01
Journal of Pharmaceutical Investigation, Vol.53, pp.153-190
Springer
Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2and Si3N4Films
Kim, Yongjae;
Kim, Seoeun;
Kang, Hojin;
You, Sanghyun;
Kim, Changkoo
;
Chae, Heeyeop
2022-08-15
ACS Sustainable Chemistry and Engineering, Vol.10, pp.10537-10546
American Chemical Society
Hexafluoroisopropanol 플라즈마를 이용한 SiO2 식각
박진수
2020-02
The Graduate School, Ajou University
과불화탄소와 불포화 불화탄소 플라즈마를 이용한 실리콘 식각의 특성
이형무
2008-02
The Graduate School, Ajou University
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
Kim, Yongjae;
Kang, Hojin;
Kim, Changkoo
;
Chae, Heeyeop
2023-04-24
ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
American Chemical Society
1
2
next
필터
Discover
닫기
Author
Chae, Heeyeop
4
Kim, Chang-Koo
4
You, Sanghyun
3
Jee, Jun Pil
2
Kang, Hojin
2
Kim, Yongjae
2
Park, Young-Joon
2
De, Anindita
1
Jeon, Dongjun
1
Kim, Seoeun
1
next >
Type
Article
4
Thesis
4
Review
2
Keyword
plasma etching
3
etch selectivity
2
perfluorocarbon
2
Artificial blood carriers
1
Artificial oxygen carriers
1
C1 source
1
carbonate
1
carboxylic acid
1
Challenges of PFC-AOCs
1
Clinical Trials
1
next >
Date issued
2020 - 2025
8
2010 - 2019
1
2000 - 2009
1
Journal
ACS Sustainable Chemistry & Engin...
2
Coatings
2
European Journal of Pharmaceutics...
1
Journal of Pharmaceutical Investi...
1