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Showing results 1 to 10 of 1563 (Search time: 0.0 seconds).

Financialization and Innovation Short-termism in OECD Countries
  • 2020-06-01
  • Review of Radical Political Economics, Vol.52, pp.259-286
  • SAGE Publications Inc.
Gas-Induced Ion-Free Stable Radical Anion Formation of Organic Semiconducting Solids as Highly Gas-Selective Probes
  • Lee, Seung Heon;
  • Oh, Byeong M.;
  • Hong, Chan Yoo;
  • Jung, Su Kyo;
  • Park, Sung Ha;
  • Jeon, Gyeong G.;
  • Kwon, Young Wan;
  • Jang, Seokhoon;
  • Lee, Youngu;
  • Kim, Dongwook;
  • Kim, Jong H.;
  • Kwon, O. Pil
  • 2019-10-02
  • ACS Applied Materials and Interfaces, Vol.11, pp.35904-35913
  • American Chemical Society
Bisphenol A degradation using waste antivirus copper film with enhanced sono-Fenton-like catalytic oxidation
  • 2021-08-01
  • Chemosphere, Vol.276
  • Elsevier Ltd
Oxidative cross-coupling of thiols for S-X (X = S, N, O, P, and C) bond formation: mechanistic aspects
  • 2021-10-28
  • Organic and Biomolecular Chemistry, Vol.19, pp.8656-8686
  • Royal Society of Chemistry
Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiCoa mark
  • 2024-05-01
  • Korean Journal of Chemical Engineering, Vol.41, pp.1307-1310
  • Springer
pH-dependent contribution of chlorine monoxide radicals and byproducts formation during UV/chlorine treatment on clothianidin
  • 이연준
  • 2022-02
  • The Graduate School, Ajou University
Microkinetic study for the effects of promoters on the oxidative coupling of methane over Na2WO4/SiO2 catalysts
  • 우예솔
  • 2023-08
  • The Graduate School, Ajou University
Two-Photon Fluorescence Probe for Selective Monitoring of Superoxide in Live Cells and Tissues
  • 2019-01-01
  • Analytical Chemistry
  • American Chemical Society
Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
  • 2018-01-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36
  • AVS Science and Technology Society
pH-dependent contribution of chlorine monoxide radicals and byproducts formation during UV/chlorine treatment on clothianidin
  • Lee, Youn Jun;
  • Lee, Chang Gu;
  • Park, Seong Jik;
  • Moon, Joon Kwan;
  • Alvarez, Pedro J.J.
  • 2022-01-15
  • Chemical Engineering Journal, Vol.428
  • Elsevier B.V.
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