Ajou University repository

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Showing results 1 to 10 of 1020 (Search time: 0.0 seconds).

Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas
  • 2020-02-01
  • Korean Journal of Chemical Engineering, Vol.37, pp.374-379
  • Springer
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
  • 2020-04-01
  • Applied Surface Science, Vol.508
  • Elsevier B.V.
3-D Printed Lattice Core for Wide Angle Scanning Radome at X-Bandoa mark
  • 2023-01-01
  • IEEE Access, Vol.11, pp.140815-140825
  • Institute of Electrical and Electronics Engineers Inc.
Design and Fabrication of Tapered Dielectric for Broadband and Wide Incident Angle Transmission
  • 2022-12-01
  • IEEE Transactions on Antennas and Propagation, Vol.70, pp.11922-11933
  • Institute of Electrical and Electronics Engineers Inc.
Direct calculation of the strong Goos-Hanchen effect of a Gaussian light beam due to the excitation of surface plasmon polaritons in the Otto configurationoa mark
  • 2019-02-20
  • Journal of Optics (United Kingdom), Vol.21
  • IOP Publishing Ltd
Scaling behavior of the localization length for TE waves at critical incidence on short-range correlated stratified random mediaoa mark
  • 2024-07-01
  • Results in Physics, Vol.62
  • Elsevier B.V.
Etching of Si-based materials using fluorocarbon plasmas : Etch characteristics and its applications
  • 김준현
  • 2019-02
  • The Graduate School, Ajou University
C4F6/Ar/O2 플라즈마에서 CH2F2 첨가에 따른 SiO2와 Si3N4의 식각속도 및 식각선택비의 각도의존성
  • 조성운
  • 2011-02
  • The Graduate School, Ajou University
Microstructural, surface morphological, and magnetic properties of oblique angle deposited Co thin films on ion-beam fabricated self-organized Si substrates
  • Patel, Shiv P.;
  • Basu, T.;
  • Kumar, M.;
  • Mishra, P.;
  • Som, T.
  • 2022-02-01
  • Materials Letters, Vol.308
  • Elsevier B.V.
Anderson localization and Brewster anomaly of electromagnetic waves in randomly-stratified anisotropic mediaoa mark
  • 2019-05-15
  • Materials Research Express, Vol.6
  • Institute of Physics Publishing
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