Ajou University repository

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Plasma atomic layer etching of molybdenum with surface fluorination
  • Kim, Yongjae;
  • Kang, Hojin;
  • Ha, Heeju;
  • Kim, Changkoo;
  • Cho, Sungmin;
  • Chae, Heeyeop
  • 2023-08-01
  • Applied Surface Science, Vol.627
  • Elsevier B.V.
New plasma etching techniques for control over Si and SiO2 etch profiles
  • 조성운
  • 2015-08
  • The Graduate School, Ajou University
Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas
  • 2020-02-01
  • Korean Journal of Chemical Engineering, Vol.37, pp.374-379
  • Springer
Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether
  • 2022-01-01
  • Korean Journal of Chemical Engineering, Vol.39, pp.63-68
  • Springer
Etching of Si-based materials using fluorocarbon plasmas : Etch characteristics and its applications
  • 김준현
  • 2019-02
  • The Graduate School, Ajou University
SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether
  • 2020-04-01
  • Applied Surface Science, Vol.508
  • Elsevier B.V.
Fabrication of High-quality Periodic Ge Nanostructures via Water-based MAC Etching and Their Application for Photovoltaics
  • 윤여준
  • 2022-02
  • The Graduate School, Ajou University
Surface hydrogeneration of vanadium dioxide nanobeam to manipulate insulator-to-metal transition using hydrogen plasmaoa mark
  • 2021-01-01
  • Journal of Asian Ceramic Societies
  • Taylor and Francis Ltd.
실리콘의 원자층식각을 위한 식각제와 이온빔의 선택에 관한 연구
  • 정희석
  • 2005
  • The Graduate School, Ajou University
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