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Plasma etching of SiO2 using heptafluoropropyl methyl ether and perfluoropropyl vinyl ether
Kim, Jun Hyun;
Park, Jin Su;
Kim, Chang Koo
2018-01-01
ECS Journal of Solid State Science and Technology, Vol.7, pp.Q218-Q221
Electrochemical Society Inc.
Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiC
oa mark
You, Sanghyun;
Sun, Eun Jae;
Hwang, Yujeong;
Kim, Chang Koo
2024-05-01
Korean Journal of Chemical Engineering, Vol.41, pp.1307-1310
Springer
Etching of Si-based materials using fluorocarbon plasmas : Etch characteristics and its applications
김준현
2019-02
The Graduate School, Ajou University
Heptafluoroisopropyl methyl ether를 이용한 SiC 플라즈마 식각
선은재
2023-02
The Graduate School, Ajou University
1
필터
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Author
Kim, Chang-Koo
2
Hwang, Yujeong
1
Kim, Jun Hyun
1
Park, Jin Su
1
Sun, Eun Jae
1
You, Sanghyun
1
김준현
1
선은재
1
Type
Article
2
Thesis
2
Keyword
Bias voltage
1
etching
1
fluorocarbon plasma
1
Global warming potential
1
HFE-347mmy
1
plasma etch
1
Plasma etching
1
plasma etching
1
Si-based material
1
SiC
1
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Date issued
2020 - 2025
2
2010 - 2019
2
Journal
ECS Journal of Solid State Scienc...
1
Korean Journal of Chemical Engine...
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