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Auto-masked surface texturing of kerf-loss free silicon wafers using hexafluoroisopropanol in a capacitively coupled plasma etching system
Kim, Suhyun;
Park, Jin Su;
Kim, Jun Hyun;
Kim, Chang Koo
;
Kim, Jihyun
2019-01-01
ECS Journal of Solid State Science and Technology, Vol.8, pp.Q76-Q79
Electrochemical Society Inc.
Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8
oa mark
You, Sanghyun;
Lee, Yu Jong;
Chae, Heeyeop;
Kim, Chang Koo
2022-05-01
Coatings, Vol.12
MDPI
Hexafluoroisopropanol 플라즈마를 이용한 SiO2 식각
박진수
2020-02
The Graduate School, Ajou University
1
필터
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Author
Kim, Chang-Koo
2
Chae, Heeyeop
1
Kim, Jihyun
1
Kim, Jun Hyun
1
Kim, Suhyun
1
Lee, Yu Jong
1
Park, Jin Su
1
You, Sanghyun
1
박진수
1
Type
Article
2
Thesis
1
Keyword
contact holes
1
etch profile
1
hexafluoroisopropanol
1
perfluorocarbon
1
plasma etching
1
플라즈마 식각
1
Date issued
2020 - 2025
2
2010 - 2019
1
Journal
Coatings
1
ECS Journal of Solid State Scienc...
1
