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Showing results 1 to 10 of 2142 (Search time: 0.0 seconds).

Toward Advanced High-k and Electrode Thin Films for DRAM Capacitors via Atomic Layer Deposition
  • Kim, Se Eun;
  • Sung, Ju Young;
  • Jeon, Jae Deock;
  • Jang, Seo Young;
  • Lee, Hye Min;
  • Moon, Sang Mo;
  • Kang, Jun Goo;
  • Lim, Han Jin;
  • Jung, Hyung Suk;
  • Lee, Sang Woon
  • 2023-10-24
  • Advanced Materials Technologies, Vol.8
  • John Wiley and Sons Inc
Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review
  • Kim, Se Eun;
  • Sung, Ju Young;
  • Yun, Yewon;
  • Jeon, Byeongjun;
  • Moon, Sang Mo;
  • Lee, Han Bin;
  • Lee, Chae Hyun;
  • Jung, Hae Jun;
  • Lee, Jae Ung;
  • Lee, Sang Woon
  • 2024-08-01
  • Current Applied Physics, Vol.64, pp.8-15
  • Elsevier B.V.
Interfacial engineering of ZrO2 metal-insulator-metal capacitor using Al2O3/TiO2 buffer layer for improved leakage propertiesoa mark
  • 2022-01-01
  • Journal of Asian Ceramic Societies, Vol.10, pp.649-659
  • Taylor and Francis Ltd.
Study of Metal–Dielectric Interface for Improving Electrical Properties and Reliability of DRAM Capacitor
  • Lim, Han Jin;
  • Choi, Jae Hyoung;
  • Cho, Gihee;
  • Chang, Jaewan;
  • Kim, Younsoo;
  • Jung, Hyung Suk;
  • Shin, Kyoung Sub;
  • Seo, Hyungtak;
  • Jeon, Hyeongtag
  • 2023-10-24
  • Advanced Materials Technologies, Vol.8
  • John Wiley and Sons Inc
Alternative surface reaction route in the atomic layer deposition of NbN thin films for reduced resistivity
  • Lee, Hyeok Jae;
  • Jang, Seo Young;
  • Lee, Hye Min;
  • Sung, Ju Young;
  • Kim, Se Eun;
  • Jeon, Jae Deock;
  • Yun, Yewon;
  • Lee, Sang Woon
  • 2023-08-15
  • Journal of Alloys and Compounds, Vol.952
  • Elsevier Ltd
Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications
  • 2021-02-23
  • ACS Applied Electronic Materials, Vol.3, pp.999-1005
  • American Chemical Society
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