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to 10 of 949 (Search time: 0.0 seconds).
Toward Specular Removal from Natural Images Based on Statistical Reflection Models
Son, Minjung;
Lee, Yunjin
;
Chang, Hyun Sung
2020-01-01
IEEE Transactions on Image Processing, Vol.29, pp.4204-4218
Institute of Electrical and Electronics Engineers Inc.
Broadband Omnidirectional Diffuse Mirrors with Hierarchically Designed All-Dielectric Surfaces
Moon, Yoon Jong;
Na, Jin Young;
Park, Yong Hyun;
Kim, Soo Bin;
Lee, Sang Woon
;
Kim, Sun Kyung
2018-03-21
ACS Photonics, Vol.5, pp.752-758
American Chemical Society
A NEW STOCHASTIC SIQR (SUSCEPTIBLE-INFECTED-QUARANTINE-REMOVED) MODEL WITH TWO DELAYS: FORECASTING COVID-19 DIFFUSION
Lee, Han Sol;
Chang, Byeong Yun
2023-06-01
International Journal of Industrial Engineering : Theory Applications and Practice, Vol.30, pp.607-622
University of Cincinnati
Highly luminous and green-emitting Eu2+ activated Eu1-xSrxAl2O4 (0 ≤ x ≤ 1) materials for NUV-LEDs
Kim, Donghyeon;
Lee, Eunji;
Ha, Donghwa;
Lee, Jungjun;
Bae, Jong Seong;
Ahn, Sung Il;
Chung, In;
Kim, Seung Joo
;
Park, Jung Chul
2019-05-15
Materials Chemistry and Physics, Vol.233, pp.185-193
Elsevier Ltd
Study of an Atmospheric Refractivity Estimation from a Clutter Using Genetic Algorithm
oa mark
Jang, Doyoung;
Kim, Jongmann;
Park, Yong Bae
;
Choo, Hosung
2022-09-01
Applied Sciences (Switzerland), Vol.12
MDPI
A study on stochastic epidemic diffusion forecasting model with observation delay and reaction delay
이한솔
2022-02
The Graduate School, Ajou University
PDGrad: Guiding Diffusion Model for Reference-Based Blind Face Restoration with Pivot Direction Gradient Guidance
oa mark
Min, Geon;
Lee, Tae Bok;
Heo, Yong Seok
2024-11-01
Sensors, Vol.24
Multidisciplinary Digital Publishing Institute (MDPI)
Acid(g)/base(g)-controlled reversible Δν1/2 of absorption spectrum of a functional dye film
Noh, Ha Lim;
Oh, Byeong M.;
Baek, Seungmin;
Park, Sung Ha;
Jeon, Gyeong G.;
Yoon, Sang Eun;
Zheng, Jian;
Kwon, O. Pil
;
Kim, Sang Wook
;
Kim, Jong H.
2020-09-01
Dyes and Pigments, Vol.180
Elsevier Ltd
Auto-masked surface texturing of kerf-loss free silicon wafers using hexafluoroisopropanol in a capacitively coupled plasma etching system
Kim, Suhyun;
Park, Jin Su;
Kim, Jun Hyun;
Kim, Chang Koo
;
Kim, Jihyun
2019-01-01
ECS Journal of Solid State Science and Technology, Vol.8, pp.Q76-Q79
Electrochemical Society Inc.
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