Ajou University repository

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Showing results 1 to 10 of 21681 (Search time: 0.0 seconds).

Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor
  • Choi, Ae Rim;
  • Seo, Seunggi;
  • Kim, Seiyon;
  • Kim, Dohee;
  • Ryu, Seung Wook;
  • Lee, Woo Jae;
  • Oh, Il Kwon
  • 2023-07-01
  • Applied Surface Science, Vol.624
  • Elsevier B.V.
Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3with a Series of Al(CH3)xCl3- xand Al(CyH2 y+1)3Precursors
  • Oh, Il Kwon;
  • Sandoval, Tania E.;
  • Liu, Tzu Ling;
  • Richey, Nathaniel E.;
  • Nguyen, Chi Thang;
  • Gu, Bonwook;
  • Lee, Han Bo Ram;
  • Tonner-Zech, Ralf;
  • Bent, Stacey F.
  • 2022-07-06
  • Journal of the American Chemical Society, Vol.144, pp.11757-11766
  • American Chemical Society
새로운 크롬 화합물을 이용한 에틸렌 3량화 촉매
  • 박동식
  • 2015-02
  • The Graduate School, Ajou University
Up-Scale Synthesis of p-(CH2-CH)C6H4CH2CH2CH2Cl and p-ClC6H4SiR3by CuCN-Catalyzed Coupling Reactions of Grignard Reagents with Organic Halidesoa mark
  • Park, Ju Yong;
  • Ko, Ji Hyeong;
  • Lee, Hyun Ju;
  • Park, Jun Hyeong;
  • Lee, Junseong;
  • Sa, Seokpil;
  • Shin, Eun Ji;
  • Lee, Bun Yeoul
  • 2022-12-20
  • ACS Omega, Vol.7, pp.46849-46858
  • American Chemical Society
Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
  • Lee, Yujin;
  • Seo, Seunggi;
  • Nam, Taewook;
  • Lee, Hyunho;
  • Yoon, Hwi;
  • Sun, Sangkyu;
  • Oh, Il Kwon;
  • Lee, Sanghun;
  • Shong, Bonggeun;
  • Seo, Jin Hyung;
  • Seok, Jang Hyeon;
  • Kim, Hyungjun
  • 2021-12-01
  • Applied Surface Science, Vol.568
  • Elsevier B.V.
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