Ajou University repository

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Showing results 1 to 10 of 1528 (Search time: 0.157 seconds).

Plasma atomic layer etching of molybdenum with surface fluorination
  • Kim, Yongjae;
  • Kang, Hojin;
  • Ha, Heeju;
  • Kim, Changkoo;
  • Cho, Sungmin;
  • Chae, Heeyeop
  • 2023-08-01
  • Applied Surface Science, Vol.627
  • Elsevier B.V.
Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
  • 2018-01-01
  • Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol.36
  • AVS Science and Technology Society
Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
  • 2023-04-24
  • ACS Sustainable Chemistry and Engineering, Vol.11, pp.6136-6142
  • American Chemical Society
실리콘의 원자층식각을 위한 식각제와 이온빔의 선택에 관한 연구
  • 정희석
  • 2005
  • The Graduate School, Ajou University
O2 Plasma을 이용한 ALD SEAM 제어 식각 방법
  • 최호진
  • 2023-02
  • The Graduate School, Ajou University
메가소닉 교반에 의한 습식 식각 시스템 특성 개선
  • Park, Tae Gyu
  • 2008-08
  • The Graduate School, Ajou University
New plasma etching techniques for control over Si and SiO2 etch profiles
  • 조성운
  • 2015-08
  • The Graduate School, Ajou University
Nonmetal-Mediated Atomic Spalling of Large-Area Monolayer Transition Metal Dichalcogenideoa mark
  • Kim, Sein;
  • Kim, Seung Il;
  • Ghods, Soheil;
  • Kim, Jin Su;
  • Lee, Young Cheol;
  • Kwun, Hyung Jun;
  • Moon, Ji Yun;
  • Lee, Jae Hyun
  • 2023-09-01
  • Small Science, Vol.3
  • John Wiley and Sons Inc
Circularly polarized microstrip antenna with bidirectional radiation using dual-layered arrow-shape slot perturbation for CubeSat application
  • 2018-08-01
  • Microwave and Optical Technology Letters, Vol.60, pp.2018-2022
  • John Wiley and Sons Inc.
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