Ajou University repository

Materials Science in Semiconductor Processing
ISSN
  • E1873-4081
  • P1369-8001
Publisher

Pergamon Press

Listed on
(Coverage)

JCR2001-2023

SJR1999-2020;2022-2023

CiteScore2011-2023

SCI2010-2019

SCIE2010-2024

CC2016-2024

SCOPUS2017-2024

Active
Active

based on the information

  • SCOPUS:2024-10
Country
ENGLAND
Aime & Scopes
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
Article List

Showing results 1 to 3 of 3

Strained BaTiO3 thin films via in-situ crystallization using atomic layer deposition on SrTiO3 substrate
  • Choi, Heung Yoon;
  • Jeon, Jae Deock;
  • Kim, Se Eun;
  • Jang, Seo Young;
  • Sung, Ju Young;
  • Lee, Sang Woon
  • 2023-06-15
  • Materials Science in Semiconductor Processing, Vol.160
  • Elsevier Ltd
Ultrafast hot-electron injection at HfN-metal oxide heterojunctions: Role of barrier height
  • Singh, Ranveer;
  • Sial, Qadeer Akbar;
  • Kim, Unjeong;
  • Nah, Sanghee;
  • Seo, Hyungtak
  • 2022-12-01
  • Materials Science in Semiconductor Processing, Vol.152
  • Elsevier Ltd
Sintering behavior and dielectric properties of A3(PO4)2 compounds (A = Ca, Sr, Ba, Mg, Zn, Ni, Cu)
  • 2022-09-01
  • Materials Science in Semiconductor Processing, Vol.148
  • Elsevier Ltd
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